1. Effect of varying N2 pressure on DC arc plasma properties and microstructure of TiAlN coatings.
- Author
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Syed, B, Hsu, T-W, Chaar, A B B, Polcik, P, Kolozsvari, S, Hĺkansson, G, Rosen, J, Johnson, L J S, Zhirkov, I, Andersson, J M, Jöesaar, M J, and Odén, M
- Subjects
PLASMA arcs ,ELECTRON density ,VACUUM arcs ,SURFACE coatings ,ELECTRON temperature ,MICROSTRUCTURE ,ELECTRIC arc - Abstract
Detailed knowledge of correlations between direct current (DC) cathodic arc deposition process parameters, plasma properties, and the microstructure of deposited coatings are essential for a comprehensive understanding of the DC cathodic arc deposition process. In this study we have probed the plasma, generated by DC arc on a Ti-50 at.% Al cathode in a N
2 ambience, at the growth front of the TiAlN coating. Several consequences of an increasing N2 pressure are observed, including a decreased electron temperature, an increased electron density, and a loss of energetic ions. As a result, the preferred growth texture switches from 220 to 111. It is also observed that neutrals in the plasma can significantly contribute to the growth of TiAlN coatings. [ABSTRACT FROM AUTHOR]- Published
- 2020
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