1. Effect of substrate bias voltage on the physical properties of dc reactive magnetron sputtered NiO thin films
- Author
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Mallikarjuna Reddy, A., Sivasankar Reddy, A., and Sreedhara Reddy, P.
- Subjects
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SUBSTRATES (Materials science) , *ELECTRIC potential , *PROPERTIES of matter , *MAGNETRON sputtering , *METALLIC oxides , *THIN films , *METALLIC glasses , *X-ray diffraction , *SPECTROPHOTOMETERS , *OPTICAL properties of metals - Abstract
Abstract: Nickel oxide (NiO) thin films were prepared on glass substrates at various bias voltages using dc reactive magnetron sputtering technique. The influence of substrate bias voltage on structural, optical and electrical properties was systematically investigated using X-ray diffraction (XRD), SEM, EDS, spectrophotometer and Hall effect studies. The NiO films are crystalline with preferential growth along (200) plane. The NiO films exhibit optical transmittance of 55% and direct band gap of 3.78eV at the substrate bias voltage of −75V. The electrical resistivity decreases as substrate bias voltage increases from 0 to −75V thereafter it was slightly increased. [ABSTRACT FROM AUTHOR]
- Published
- 2011
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