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There has been a compelling demand of fabricating high-resolution complex three-dimensional (3D) structures in nanotechnology. While two-photon lithography (TPL) largely satisfies the need since its introduction, its low writing speed and high cost make it impractical for many large-scale applications. We report a digital holography-based TPL platform that realizes parallel printing with up to 2000 individually programmable laser foci to fabricate complex 3D structures with 90 nm resolution. This effectively improves the fabrication rate to 2,000,000 voxels/sec. The promising result is enabled by the polymerization kinetics under a low-repetition-rate regenerative laser amplifier, where the smallest features are defined via a single laser pulse at 1 kHz. We have fabricated large-scale metastructures and optical devices of up to centimeter-scale to validate the predicted writing speed, resolution, and cost. The results confirm our method provides an effective solution for scaling up TPL for applications beyond laboratory prototyping. The application of two-photon lithography has been limited by the low writing speed. The authors reported a multi-focus improved lithography platform that employs up to 2000 laser foci to perform parallel fabrication with 90 nm resolution via optimised polymerisation and single-pulse printing strategy. [ABSTRACT FROM AUTHOR]

There has been a compelling demand of fabricating high-resolution complex three-dimensional (3D) structures in nanotechnology. While two-photon lithography (TPL) largely satisfies the need since its introduction, its low writing speed and high cost make it impractical for many large-scale applications. We report a digital holography-based TPL platform that realizes parallel printing with up to 2000 individually programmable laser foci to fabricate complex 3D structures with 90 nm resolution. This effectively improves the fabrication rate to 2,000,000 voxels/sec. The promising result is enabled by the polymerization kinetics under a low-repetition-rate regenerative laser amplifier, where the smallest features are defined via a single laser pulse at 1 kHz. We have fabricated large-scale metastructures and optical devices of up to centimeter-scale to validate the predicted writing speed, resolution, and cost. The results confirm our method provides an effective solution for scaling up TPL for applications beyond laboratory prototyping. The application of two-photon lithography has been limited by the low writing speed. The authors reported a multi-focus improved lithography platform that employs up to 2000 laser foci to perform parallel fabrication with 90 nm resolution via optimised polymerisation and single-pulse printing strategy. [ABSTRACT FROM AUTHOR]