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In recent years, two-dimensional (2D) type-II van der Waals (vdW) heterojunctions have emerged as promising candidates for high-performance photodetectors. However, direct experimental evidence confirming the enhancement of photoelectric properties by the heterojunction’s type and structure remains scarce. In this work, we present flexible photodetectors based on individual GaSe and MoS2, as well as a vertically stacked type-II GaSe/MoS2 vdW heterojunction on polyethylene terephthalate (PET) substrate. These devices demonstrate outstanding responsivities and rapid response speeds, ensuring stable and repeatable light detection. It is notable that the GaSe/MoS2 heterojunction photodetector exhibits the highest on-off ratio and fastest response speed, attributed to the formation of type-II band alignment. Furthermore, the GaSe/MoS2 heterojunction photodetector maintains robust stability even in a bent state, highlighting remarkable flexibility. This work exemplifies the type-II vdW heterojunctions in enhancing photoelectric properties through direct in-situ experimentation, laying the groundwork for practical applications of 2D flexible photodetectors.

In recent years, two-dimensional (2D) layered transition metal dichalcogenides (TMDs) have received significant attention due to their exceptional electrical and optical properties. Among these 2D materials, ReS2 distinguishes itself through its unique optical and conductance anisotropy. Despite concerted efforts to produce high-quality ReS2, the unique interlayer decoupling properties pose substantial challenges in growing large-area ReS2 thin films, with the preparation of single layers proving even more complex. In this work, large-scale continuous monolayer and bilayer ReS2 films were successfully grown on mica substrates using low-pressure chemical vapor deposition (LPCVD). Photodetectors were fabricated using the prepared high-quality ReS2 films, and the devices presented stable photoresponse and enhanced response sensitivity. The production of continuous ReS2 atomic layers heralds promising prospects for large-scale integrated circuits and advances the practical application of optoelectronics based on 2D layered materials.

Monolayer MoS2 has emerged as a highly promising candidate for next-generation electronics. However, the production of monolayer MoS2 with a high yield and low cost remains a challenge that impedes its practical application. Here, a significant breakthrough in the batch production of wafer-scale monolayer MoS2 via chemical vapor deposition is reported. Notably, a single preparation process enables the growth of multiple wafers simultaneously. The homogeneity and cleanliness of the entire wafer, as well as the consistency of different wafers within a batch, are demonstrated via morphology characterizations and spectroscopic measurements. Field-effect transistors fabricated using the grown MoS2 exhibit excellent electrical performances, confirming the high quality of the films obtained via this novel batch production method. Additionally, we successfully demonstrate the batch production of wafer-scale oxygen-doped MoS2 films via in situ oxygen doping. This work establishes a pathway towards mass preparation of two-dimensional materials and accelerates their development for diverse applications.