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The programming speed in a phase change memory (PCM) relies on the kinetics of crystallization in the pulsed regime. To predict the programming speed and retention of a PCM, a careful understanding and modeling of crystallization in the phase change material is essential. In this paper, we study crystallization kinetics directly in PCM devices. From thermal annealing and pulsed-set experiments, we extract the temperature dependence of the crystallization in a wide temperature range between 170^\circC and the melting point (about 620^\circC). Our results indicate two markedly different activation energies below/above 300^\circC, thus providing evidence for a non-Arrhenius crystallization kinetics in PCM. [ABSTRACT FROM PUBLISHER]

The amorphous phase of the chalcogenide material in phase-change memory (PCM) devices is sensitive to temperature-activated crystallization and structural relaxation (SR). The latter leads to a change of device/material properties, such as the mobility band gap, the resistance, and the threshold voltage VT for threshold switching. In this paper, we present a VT drift model based on physical descriptions of the electrical transport, the threshold switching, and the SR. We introduce an analytical formula describing the relation between the drift slopes of resistance and VT via the subthreshold slope STS of the I– V curve. A numerical model predicting the time evolution of VT for different programmed states in the PCM multilevel cell is finally presented and compared with experiments. [ABSTRACT FROM PUBLISHER]