1. Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films
- Author
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Du, C.C., Wei, T.C., Chang, C.H., Lee, S.L., Liang, M.W., Huang, J.R., Wu, C.H., Shirakura, A., Morisawa, R., and Suzuki, T.
- Subjects
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PLASMA-enhanced chemical vapor deposition , *SILICON films , *EMISSION spectroscopy , *PROCESS control systems , *STABILIZING agents , *SILANE , *CRYSTAL growth - Abstract
Abstract: The decisive criterion associated with the species emission intensity ratio (Hα/SiH*) which characterizes the crystallinity of microcrystalline silicon (μc-Si) film was found to display an unstable behavior resulting from species concentration variation during μc-Si film growth with optical emission spectroscopy (OES) tool. In this study, a real-time process control system i.e. closed-loop system was developed. It aims to control the species intensity ratio with OES device in a very high frequency (VHF) plasma enhanced chemical vapor deposition reactor, via modulating the VHF power and silane dilution to improve μc-Si film growth for high efficiency a-Si/μc-Si tandem solar cell. The experiment results show that the closed-loop system stabilized the Hα/SiH* intensity ratio within a variation of 5% during the μc-Si film deposition process. Higher growth rate of μc-Si film with the same crystallinity was obtained in the closed loop system which consumed less power and SiH4 gas than in the open loop system, i.e. without process control. [Copyright &y& Elsevier]
- Published
- 2012
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