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A new cooling crystallization method is applied to plate copper on SiCp. Cu(NO3)2·3H2O is crystallized on SiCp by decreasing the solution temperature, and is heat‐treated to obtain CuO coating which is finally reduced to copper coating. Based on the optimizing of SiCp content and CuO reduction temperature, the effects of copper plating on SiCp on the spreading and infiltration of AlSi12 alloy melt are studied. The results show that the optimum coating effect is achieved when the SiCp content is 11.63% and the reduction temperature of CuO is 475 °C. The spreading area of AlSi12 alloy melt on the 15 μm copper‐coated SiCp increases by 53.27% compared to the uncoated SiCp when holds at 950 °C for 20 min, indicating that copper plating has a significant improvement on the wettability of AlSi12 melt and SiCp. Additionally, infiltration preparation of copper‐plated SiCp/Al alloy composites is achieved at a pressure of 0.3 MPa, but not under pressureless conditions. The main reason for this is the granular Cu on SiCp cannot form a complete Cu film. Therefore, the formation of complete Cu films on SiCp is presumed to be an important development direction for solving the problem of infiltration preparing ultrathick SiCp/Al composites. [ABSTRACT FROM AUTHOR]

Constructing molecular-scale precise host–guest networks by sequential co-deposition strategy. [Display omitted] • Molecular beam epitaxy and thermal annealing for constructing chiral Kagome-like templates. • Kagome-like template precisely regulates the adsorption of the guest molecule C 60. • Density functional theory simulations reveal the adsorption behavior of host and guest molecules on Cu(1 1 1). Scanning tunneling microscopy for high-resolution characterization of molecules. • A controllable and efficient method to design atomically precise ordered host–guest assemblies advancing the approach is yet another step toward the fabrication of molecular devices. Supramolecular self-assembly offers a feasible route for nanopatterning and functionality. The construction and precise control of selective adsorption at the molecular scale play essential roles in fundamental sciences and practical applications. Molecular tiling such as trihexagonal tiling Kagome networks has potential promising chemical and physical properties. Distorted Kagome-like networks controllable fabrication is possible by coupling molecular functional groups and substrate atoms. A chiral Kagome-like network was constructed using IFDO ([1,2-b]fluorene-6,12-dione) as precursor molecules complemented with molecular beam epitaxy and annealing strategies. Revealing arrangements of the assembled network of O-Cu metal coordination linked Kagome-like networks on the Cu(1 1 1) surface and their assembly mechanisms and cavity characteristics were explored in detail through scanning tunneling microscopy combined with density functional theory. Based on the electronic state difference between the hole center of the network and the molecular backbone, the host–guest network was successfully prepared by co-depositing C 60 molecules. Kagome-like networks could as an efficient template for regulating the adsorption configuration of C 60. Our results demonstrate a controllable and efficient method to design atomically precise ordered host–guest assemblies on solid surfaces, advancing the approach is yet another step toward the fabrication of molecular devices. [ABSTRACT FROM AUTHOR]