1. Thickness measurement in ultrathick multilayer microstructures
- Author
-
Uwe Richter and Rainer Engelke
- Subjects
Engineering ,Assurance qualite ,business.industry ,Microfluidics ,Nanotechnology ,Photoresist ,Condensed Matter Physics ,Microstructure ,Electronic, Optical and Magnetic Materials ,Hardware and Architecture ,Microfluidic channel ,Optoelectronics ,Fluidics ,Gold surface ,Electrical and Electronic Engineering ,business ,Multi layer - Abstract
Microparts are more and more mass products and quality assurance becomes an important factor in manufacturing. Based on a new optical principle, a tool was developed and tested which is well suited for easy non-destructive measurements at microstructures as well as for measurement at transparent layers. Thickness measurement of ca. 1 mm ultrathick photoresist layers on non-patterned high-reflective gold surface was demonstrated. As well, measurement of multi layer systems consisting of each several hundred micrometers thick transparent layers was verified at capped microfluidic channel structures.
- Published
- 2010
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