1. Thermal treatment effect of the GaN buffer layer on the photoluminescence characteristics of the GaN epilayer
- Author
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H. Y. An, H. J. Lee, K. Y. Lim, Eun-Kyung Suh, G. M. Yang, J. H. Kim, and O. H. Cha
- Subjects
Materials science ,Photoluminescence ,Condensed matter physics ,Condensed Matter::Other ,Exciton ,Binding energy ,Wide-bandgap semiconductor ,General Physics and Astronomy ,Condensed Matter::Mesoscopic Systems and Quantum Hall Effect ,Condensed Matter::Materials Science ,Full width at half maximum ,Metalorganic vapour phase epitaxy ,Electronic band structure ,Wurtzite crystal structure - Abstract
Photoluminescence properties of undoped wurtzite GaN epilayers grown on sapphire substrates with different buffer layer treatment conditions in metalorganic chemical vapor deposition (MOCVD) growth have been studied as a function of temperature. At low temperatures, very well resolved spectral features associated with the GaN band structure were observed. From the photoluminescence (PL) data for free excitons, an accurate value of the A exciton binding energy was found. The localization energies of the excitons bound to neutral acceptor are found to agree with Haynes’ rule with the proportionality factor close to 0.1. The longitudinal optical (LO) phonon assisted photoluminescence associated with both the bound and free excitons has been observed. The characteristics of free excitons and their LO phonon replica have been studied in detail with the temperature variation and related to the point defects. The behavior of the peak energy and the full width at half maximum of the exciton band as a function of ...
- Published
- 1999