1. Reflectivity of VUV-sensitive Silicon Photomultipliers in Liquid Xenon
- Author
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M. Heffner, Thilo Michel, M. Hughes, F. Vachon, Jean-Francois Pratte, Aleksey E. Bolotnikov, A. Craycraft, R. DeVoe, C. Gingras, C.R. Natzke, A. De St. Croix, T. I. Totev, K. Murray, Gisela Anton, J. C. Nzobadila Ondze, S. Al Kharusi, R. Saldanha, O. Nusair, J. Ringuette, R. Krücken, W. M. Fairbank, M. Worcester, A. Der Mesrobian-Kabakian, N. Massacret, Lorenzo Fabris, David Moore, Wen-Qi Yan, K. Harouaka, R. Gornea, E. Hansen, C. T. Overman, Samuele Sangiorgio, I. Ostrovskiy, H. Rasiwala, M. Tarka, K. S. Kumar, M. Elbeltagi, R. Tsang, A. Larson, John L. Orrell, T. Daniels, E. Caden, F. Retière, Z. Li, Mike Richman, N. Roy, S. Feyzbakhsh, G. Giacomini, M. Murra, G. Li, E. Raguzin, A. Pocar, A. Iverson, Ethan Brown, B. Mong, C. Licciardi, F. Nolet, J. P. Brodsky, A. Tidball, T. McElroy, Shu Li, T. Rossignol, V. A. Belov, R. MacLellan, O. Zeldovich, M. Medina Peregrina, A. Karelin, B. T. Cleveland, K. Odgers, I. Badhrees, Venkatesh Veeraraghavan, D. Fairbank, A. Kuchenkov, M. Wagenpfeil, M. Walent, Giorgio Gratta, Qing Xia, Sergio Ferrara, C. Vivo-Vilches, D. Schulte, Govinda Adhikari, G. S. Ortega, J. Todd, Arun Kumar Soma, C. Weinheimer, T. Brunner, D. S. Leonard, Serge A. Charlebois, A. Odian, L. Darroch, S. Rescia, C. Huhmann, M. J. Dolinski, M. J. Jewell, R. Lindsay, D. Chernyak, L. Althueser, V.N. Stekhanov, M. L. Di Vacri, T. Ziegler, Y. Lan, S. Parent, L. J. Kaufman, A. Gorham, S. X. Wu, P. A. Breur, J. Bane, A. E. Robinson, Eric W. Hoppe, J. Echevers, D. Goeldi, G.J. Ramonnye, Liang Yang, A. Jamil, S. Thibado, C. Richard, M. Chiu, J. Farine, P. Martel-Dion, Guofu Cao, T. Bhatta, J. Nattress, E. Angelico, B. Chana, Douglas H Beck, T. Stiegler, J. Schneider, K. Deslandes, P. C. Rowson, A. House, A. Fieguth, C.A. Hardy, U. Wichoski, S. Viel, G. Gallina, A. Piepke, I. J. Arnquist, P. Gautam, K. G. Leach, R.J. Newby, S. Triambak, F. Spadoni, and C. Chambers
- Subjects
Materials science ,Physics - Instrumentation and Detectors ,APDS ,chemistry.chemical_element ,FOS: Physical sciences ,01 natural sciences ,7. Clean energy ,030218 nuclear medicine & medical imaging ,law.invention ,03 medical and health sciences ,0302 clinical medicine ,Optics ,Silicon photomultiplier ,Xenon ,law ,0103 physical sciences ,Wafer ,Angular resolution ,Instrumentation ,Mathematical Physics ,010308 nuclear & particles physics ,business.industry ,Detector ,Instrumentation and Detectors (physics.ins-det) ,Avalanche photodiode ,chemistry ,Angle of incidence (optics) ,business - Abstract
Silicon photomultipliers are regarded as a very promising technology for next-generation, cutting-edge detectors for low-background experiments in particle physics. This work presents systematic reflectivity studies of Silicon Photomultipliers (SiPM) and other samples in liquid xenon at vacuum ultraviolet (VUV) wavelengths. A dedicated setup at the University of M\"unster has been used that allows to acquire angle-resolved reflection measurements of various samples immersed in liquid xenon with 0.45{\deg} angular resolution. Four samples are investigated in this work: one Hamamatsu VUV4 SiPM, one FBK VUV-HD SiPM, one FBK wafer sample and one Large-Area Avalanche Photodiode (LA-APD) from EXO-200. The reflectivity is determined to be 25-36% at an angle of incidence of 20{\deg} for the four samples and increases to up to 65% at 70{\deg} for the LA-APD and the FBK samples. The Hamamatsu VUV4 SiPM shows a decline with increasing angle of incidence. The reflectivity results will be incorporated in upcoming light response simulations of the nEXO detector., Comment: 18 pages, 11 figures
- Published
- 2021