1. First Principles Calculations of the Effect of Stress in the I-V Characteristics of the CoSi2/Si Interface
- Author
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Shesh Mani Pandey, Oscar D. Restrepo, El Mehdi Bazizi, Qun Gao, and Eduardo Cruz-Silva
- Subjects
010302 applied physics ,Materials science ,Condensed matter physics ,Silicon ,Ab initio ,chemistry.chemical_element ,02 engineering and technology ,Semiconductor device ,021001 nanoscience & nanotechnology ,Thermal conduction ,01 natural sciences ,Brillouin zone ,Stress (mechanics) ,chemistry.chemical_compound ,chemistry ,Electrical resistivity and conductivity ,0103 physical sciences ,Silicide ,0210 nano-technology - Abstract
We present ab initio-based electronic transport calculations on the effect of uniaxial and bi-axial stress on the CoSi 2 /n Si interface resistivity for the three main silicon crystallographic directions. For the [001] case, we identify two distinctive low and high bias conduction regimes for both compressive and tensile stress. In these regimes, the current is dominated by electronic transmission pathways near the Γ point for bias up to ~0.1V, while for higher bias it is dominated by transmission at the (±1/2, ±1/2) conduction band valleys of the Brillouin zone, which results in a contact resistivity decrease of up to 30% at 0.2V bias. This effect is less pronounced for the [110] direction, and negligible for the [111] case due to the symmetry of the Si conduction band valleys along these directions. This study provides insight into stress-based optimization pathways for contact resistivity reduction of silicide interfaces in next generation semiconductor devices.
- Published
- 2018
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