1. Chemical Vapor Deposition of Ionic Liquids for the Fabrication of Ionogel Films and Patterns
- Author
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Alexander John Cruz, Tom Hauffman, Kristof Marcoen, Maider Calderon Gonzalez, Martin Obst, Giel Arnauts, Rob Ameloot, Materials and Chemistry, Faculty of Engineering, and Electrochemical and Surface Engineering
- Subjects
Fabrication ,Materials science ,Chemistry(all) ,Nanotechnology ,02 engineering and technology ,Chemical vapor deposition ,Ionic liquid ,micropattern ,010402 general chemistry ,01 natural sciences ,photolitography ,Catalysis ,law.invention ,chemical vapor deposition ,chemistry.chemical_compound ,law ,Deposition (phase transition) ,ionic liquid ,General Medicine ,General Chemistry ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,ionogel ,chemistry ,Microreactor ,Photolithography ,0210 nano-technology - Abstract
Film deposition and high-resolution patterning of ionic liquids (ILs) remain a challenge, despite a broad range of applications that would benefit from this type of processing. Here, we demonstrate for the first time the chemical vapor deposition (CVD) of ILs. The IL-CVD method is based on the formation of a non-volatile IL through the reaction of two vaporized precursors. Ionogel micropatterns can be easily obtained via the combination of IL-CVD and standard photolithography, and the resulting microdrop arrays can be used as microreactors. The IL-CVD approach will facilitate leveraging the properties of ILs in a range of applications and microfabricated devices. ispartof: ANGEWANDTE CHEMIE-INTERNATIONAL EDITION vol:60 issue:49 pages:25668-25673 ispartof: location:Germany status: published
- Published
- 2021