1. Effect of deposition conditions on thermo-mechanical properties of free standing silicon-rich silicon nitride thin film
- Author
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Hak-Joo Lee, Jun-Hwan Goo, Seungmin Hyun, Jung Min Park, Yun Hwangbo, and Walter L. Brown
- Subjects
Materials science ,Silicon ,chemistry.chemical_element ,Condensed Matter Physics ,Atomic and Molecular Physics, and Optics ,Thermal expansion ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,chemistry.chemical_compound ,chemistry ,Silicon nitride ,Residual stress ,Deposition (phase transition) ,Gas composition ,Electrical and Electronic Engineering ,Thin film ,Composite material ,Elastic modulus - Abstract
Using resonance and bulge techniques, the mechanical properties of free standing Si-rich SiN"x membranes were precisely measured to evaluate the effect of deposition conditions on them over a narrow range of particular technological interest. Values of the elastic modulus, the residual stress and the thermal expansion coefficient were obtained. It was found that even small differences in gas composition in low pressure CVD deposition make substantial changes in residual stress and significant but much smaller changes in the elastic modulus.
- Published
- 2012
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