1. Industrialization of a Laser Produced Plasma EUV Light Source for Lithography
- Author
-
I. Fomenkov, A. Schafgans, S. Rokitski, M. Kats, J. Stewart, A. LaForge, A. Ershov, M. Purvis, Y. Tao, M. Vargas, J. Grava, P. Das, L. Urbanski, R. Rafac, J. Lukens, C. Rajyaguru, G. Vaschenko, M. Abraham, D. Brandt, and D. Brown
- Subjects
Materials science ,business.industry ,Extreme ultraviolet lithography ,010401 analytical chemistry ,chemistry.chemical_element ,02 engineering and technology ,Plasma ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,0104 chemical sciences ,law.invention ,Optics ,Semiconductor ,Light source ,chemistry ,law ,Extreme ultraviolet ,Optoelectronics ,0210 nano-technology ,business ,Tin ,Lithography - Abstract
ASML is committed to develop high power EUV source technology for use in EUV lithography for high-volume-manufacturing (HVM) of semiconductors. A stable dose controlled Laser-Produced-Plasma (LPP) EUV source has been successfully developed and introduced using a CO2 laser and small tin (Sn) droplets.
- Published
- 2017
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