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2. NON-DESTRUCTIVE MATERIAL HOMOGENEITY EVALUATION USING SCANNING MILLIMETER WAVE BEAM.

Author

Laurinavičius, A., Anbinderis, T., Martianova, O., and Prishutov, Yu.

Subjects
MILLIMETER waves, SCANNING electron microscopes, SCATTERING amplitude (Physics), DIELECTRICS, SEMICONDUCTOR wafers, SEMICONDUCTORS
Abstract

Millimeter wave bridge technique for non-destructive material homogeneity characterization is described. The idea of this technique is the local excitation of the millimeter waves in the testing material and the measurement of the transmitted wave amplitude and phase in different places of it, i.e. the material plate is scanned by the beam of the millimeter waves. Same results of the homogeneity measurements for semiconductor and dielectric wafers are presented. The measurement technique sensitivity is discussed. [ABSTRACT FROM AUTHOR]

Published
2006

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