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Boron doped multilayers based on silicon carbide/silicon rich carbide, aimed at the formation of silicon nanodots for photovoltaic applications, are studied. X-ray diffraction confirms the formation of crystallized Si and 3C-SiC nanodomains. Fourier Transform Infrared spectroscopy indicates the occurrence of remarkable interdiffusion between adjacent layers. However, the investigated material retains memory of the initial dopant distribution. Electrical measurements suggest the presence of an unintentional dopant impurity in the intrinsic SiC matrix. The overall volume concentration of nanodots is determined by optical simulation and is shown not to contribute to lateral conduction. Remarkable higher room temperature dark conductivity is obtained in the multilayer that includes a boron doped well, rather than boron doped barrier, indicating efficient doping in the former case. Room temperature lateral dark conductivity up to 10-3 S/cm is measured on the multilayer with boron doped barrier and well. The result compares favorably with silicon dioxide and makes SiC encouraging for application in photovoltaic devices. © 2012 Elsevier B.V. All rights reserved.

Silicon carbide/silicon rich carbide multilayers, aimed at the formation of silicon nanodots for photovoltaic applications, have been studied. The electrical properties have been investigated at the nano-scale by conductive Atomic Force Microscopy (c-AFM) and at macro-scale by temperature dependent conductivity measurements. The mixture is composed of highly conductive Si nanoclusters and moderately conductive SiC nanoclusters in a disordered matrix. The conduction mechanism takes place via band states induced by the disorder at the interface between nanodot clusters. Structural properties have been extracted by optical spectroscopy analyses. The results contribute to the understanding of the microscopical electronic mechanisms of the composite material, which is a candidate for third generation photovoltaics.

Silicon nanocrystals (Si NCs) are a promising candidate for the top cell of an all-Si tandem solar cell with a band gap from 1.3-1.7 eV, tuneable by adjusting NC size. They are readily produced within a Si-based dielectric matrix by precipitation from the Si excess in multilayers of alternating stoichiometric and silicon-rich layers. Here we examined the luminescence and transport of Si NCs embedded in SiC. We observed luminescence that redshifts from 2.0 to 1.5 eV with increasing nominal NC size. Upon further investigation, we found that this redshift is to a large extent due to Fabry-Pérot interference. Correction for this effect allows an analysis of the spectrum emitted from within the sample. We also produced p-i-n solar cells and found that the observed I-V curves under illumination could be well-fitted by typical thin-film solar cell models including finite series and parallel resistances, and a voltage-dependent current collection function. A minority carrier mobility-lifetime product on the order of 10-10 cm2/V was deduced, and a maximum open-circuit voltage of 370 mV achieved.

In this work we present the results we obtained by processing 1 Ωcm p and n-type, multi-crystalline silicon wafers when a double hydrogenated amorphous/crystalline silicon heterojunction is applied to sandwich the substrate, at the sunward surface to form the emitter and at the rear side to act as back surface field. We have investigated the role of the multi-crystalline silicon surface conditioning, on the base of illuminated and dark current-voltage characteristic, quantum efficiency measurements, and overall photovoltaic solar cell performance. In particular, a comparison between an acidic isotexturing and a chemical polishing treatment is presented and discussed in detail. We have found that the morphology of the multi-crystalline silicon surface plays a tough role in the a-Si:H properties when used as surface passivating layer. The commercial acidic surface treatment, commonly used in diffused junction mc-Si solar cell fabrication, requires a level of passivation which is not easily achievable using the very thin a-Si:H film, needed in heterojunction technology. The deposition of a uniform thickness over a whole textured silicon surface of a thin amorphous layers still requires further investigation and improvement. Nevertheless the high Voc obtained on p-type doped mc-Si (625 mV) remarks the effectiveness of a-Si:H/mc-Si technology in achieving high photovoltaic efficiency using low thermal budget manufacturing process. (© 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

Uterus didelphys, also known as a duplicated uterus, is an embryological abnormality resulting from the failure of fusion of the Mullerian ducts, causing full uterine development to erroneously occur bilaterally. The occurrence of uterus didelphys is very low in the general population and often predisposes women to a variety of gynecological difficulties. There appears to be a high association with obstetrical complications, such as spontaneous abortion, preterm labor, cervical incompetence, and malpresentation. Uterus didelphys is also associated with urinary tract abnormalities. Presented is a case of a woman with a didelphys uterus and a twin pregnancy.

In this work we present a structural, optical and electrical characterization of Si x C 1− x /SiC multilayer systems with different silicon content. After the deposition process, an annealing treatment was carried out in order to induce the silicon nanocrystals formation. By means of energy-filtered transmission electron microscopy (EFTEM) we observed the structural morphology of the multilayers and the presence of crystallized silicon nanoprecipitates for samples annealed up to 1100 °C. We discuss the suitability of optical techniques such as Raman scattering and reflectance and transmittance ( R&T ) for the evaluation of the crystalline fraction of our samples at different silicon excess ranges. In addition, the combination of R&T measurements with simulation has proved to be a useful instrument to confirm the structural properties observed by EFTEM. Finally, we explore the origin of the extremely high current density revealed by electrical measurements, probably due to the presence of an undesired defective SiC y O z ternary compound layer, already supported by the structural and optical results. Nevertheless, the variation of the electrical measurements with the silicon amount indicates a small but significant contribution from the multilayers.

Indium tin oxide (ITO) thin films were deposited by magnetron sputtering from a ceramic target, and annealed at temperatures up to 1000 °C in N2 atmosphere. Some samples were capped in a-Si:H or spin-on glass to prevent residual oxygen contamination from the annealing ambient, and annihilation of oxygen vacancies. The electrical and optical properties were measured before and after annealing. It is found that the protecting layer effectively limits the ITO degradation up to 900 °C, whereas high transparency is preserved in all cases. The results indicate the applicability of the procedure to high temperature devices, and opens the way to the application of a variety of nanostructured materials in advanced photovoltaic devices.