1. Back-End-of-Line Compatible Transistors for Monolithic 3-D Integration
- Author
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Jeffrey Smith, Sourav Dutta, Benjamin Grisafe, Srivatsa Srinivasa, Huacheng Ye, and Suman Datta
- Subjects
Dynamic random-access memory ,Silicon ,business.industry ,Computer science ,Transistor ,Electrical engineering ,chemistry.chemical_element ,02 engineering and technology ,020202 computer hardware & architecture ,law.invention ,Back end of line ,Capacitor ,Stack (abstract data type) ,chemistry ,Hardware and Architecture ,law ,Charge trap flash ,Hardware_INTEGRATEDCIRCUITS ,0202 electrical engineering, electronic engineering, information engineering ,Electrical and Electronic Engineering ,business ,Software - Abstract
The manufacturers of high-performance logic have been ardent champions of Moore's Law, which has resulted in exponential increase in aerial transistor density to 100 million transistors per square millimeter of silicon real estate. However, it is the memory chip makers who have taken the first step toward escaping the confines of scaling within the horizontal plane and have embraced the vertical or the third dimension. The dynamic random access memory manufacturers have adopted stacked capacitors that tower above the silicon plane that hosts the access and peripheral transistors, whereas the nand flash memory technologists can stack 128 layers of charge trap flash cells on top of each other in a monolithic fashion. To enable monolithic three-dimensional (M3D) integration of high-performance logic, one needs to solve the fundamental challenge of low temperature (
- Published
- 2019
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