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1. Process extensions in optical lithography enabling 45-nm technologies

Author

Zandbergen, Peter, Van Steenwinckel, David, Lammers, Jeroen H., Kwinten, Hans, and Juffermans, Casper

Subjects
Integrated circuit fabrication -- Research, Integrated circuit fabrication, Business, Computers, Electronics, Electronics and electrical industries
Abstract

This paper describes approaches in the field of process extensions, complementary to the more traditional optical extension techniques, to enable the extension of optical lithography to 45-nm technologies. Index Terms--Acid diffusion, optical lithography, overbake, postexposure bake, process extensions.

Published
2005

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