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GeSn complementary metal-oxide-semiconductor (CMOS) devices have attracted much attention for future VLSI technology nodes due to high carrier mobility. However, Fermi-level pinning in metal/n-GeSn...

GeSn is a promising material for high-performance electronic and photonic devices. In this work, we present our recent achievements on high electron mobility in GeSn n-MOSFETs, an extremely low contact resistivity in metal/n-GeSn junctions, and a high tunneling current density in GeSn Esaki diodes with large peak-to-valley current ratios. Last, we present the first two-dimensional hole gas in the undoped GeSn/Ge heterostructures with strong spin-orbit coupling (SOC) effects, which is tunable by top gating.

To realize a full-scale solid-state computer, both quantum processors and classical logic controllers are suggested to be operated at cryogenic temperatures to avoid the issues of signal latency through the room-temperature controllers and the corresponding wiring complexity, and interface of quantum processors and classical controllers. While cryo-CMOS devices have been the main focus recently to address those issues, there were only few works on cryogenic memory devices published [1]. Potential candidates for cryogenic applications are based on Si MOS platforms, which would result in integration challenges with Si/SiGe [2] or Ge/GeSi [3] qubit devices. In this work, we demonstrate multi-bit cryogenic flash operations on both Si/SiGe and Ge/GeSi heterostructures for the first time at 4 K with a high endurance of > 103, long retention time of > 103 s, and a memory window of > 0.2V.

In this work, a single-crystalline β-Ga2O3 epilayer was grown on (0001) sapphire at low temperature by low-pressure metal organic chemical vapor deposition. The optimized parameters for the chamber pressure, oxygen flow, and growth temperature were 15 Torr, 200 sccm, and 500 °C, respectively. The β-Ga2O3 epilayer was fabricated as a metal-semiconductor-metal solar-blind deep ultraviolet photodetector. Due to the gallium oxide grown at low temperature, the as-grown β-Ga2O3 epilayer was annealed at 800 °C in atmosphere or in a nitrogen environment. The effects of defects of the β-Ga2O3 epilayer before and after N2 annealing were studied using x-ray diffraction system, cathodoluminescence at differential temperature, and Hall measurement. The β-Ga2O3 epilayer that was N2 annealed for 15 min presented better photodetector performance than the as-grown β-Ga2O3 epilayer. The annealed epilayer exhibited a dark current of 1.6 × 10−13 A under 5 V bias.