1. Performance and Operation of Stressed Dual-Gap RF MEMS Varactors
- Author
-
Michal Okoniewski and Greg McFeetors
- Subjects
Microelectromechanical systems ,Engineering ,Fabrication ,business.industry ,Electrical engineering ,Hardware_PERFORMANCEANDRELIABILITY ,Capacitance ,Dual (category theory) ,law.invention ,Capacitor ,Quality (physics) ,law ,Q factor ,Hardware_INTEGRATEDCIRCUITS ,Voltage source ,business - Abstract
The design, fabrication and measurement of a continuously tunable RF MEMS capacitor is described. The capacitor's dual gap height architecture allows for electrostatic tuning with low resistive loss and a large tuning range. A new dual tuning scheme is introduced for use with two voltage sources. This dual tuning, coupled with a stress-induced bridge, is used to reach further device tuning. Measurements indicate a continuously tunable capacitance range of 6.2:1 with a quality factor over 50 at 30GHz for 310fF.
- Published
- 2006