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The angular resolution of electron backscatter diffraction (EBSD) measurements can be significantly improved using an analysis based on determination of small shifts in features from one pattern to the next using cross-correlation functions. Using pattern shift measurements at many regions of the pattern, errors in the best fit strain and rotation tensors can be reduced. The authors show that elements of the strain tensor and small misorientations can be measured to ±10 -4 and ±0.006° for rotations. We apply the technique to two quite different materials systems. First, we determine the elastic strain distribution near the interface in a cross-sectioned SiGe epilayer, Si substrate semiconductor heterostructure. The plane stress boundary conditions at the sample surface are used to separate every term in the strain tensor. Second, the applicability to structural materials is illustrated by determining the lattice curvature caused by dislocations within the plastic zone associated with the wake and tip of a fatigue crack in a Ni based superalloy. The lattice curvatures are used to calculate the geometrically necessary dislocation content in the plastic zone. © 2006 Institute of Materials, Minerals and Mining.

International audience; High resolution EBSD directly compares electron backscattering patterns (EBSPs), generated in a scanning electron microscope, to measure relative strain and rotation to a precision of ∼10−4 in strain and 10−4 rad (0.006°) in rotation. However the measurement of absolute strain and rotation requires reference EBSPs of known strain and orientation (or a far field region of known strain). Recent suggestions of using simulated EBSPs with known strain show much promise. However precise measurement of the experimental geometry (pattern centre) is required. Common uncertainties of 0.5% in pattern centre result in uncertainty of ∼10−3 in strain state. Aberrations in the compact lenses used for EBSP capture can also result in image shifts that correspond to strains/rotations of ±10−3 between experimental and simulated EBSPs. Simulated EBSPs can be generated using dynamical or kinematic models (or a combination of the two). The choice in simulation model has a significant effect on the measured shifts, particularly at zone axis and high structure factor bands, due to large intensity variations, and for simple kinematic simulations can result in the measurement of rogue shifts and thus erroneous strain measurements. Calibrant samples of known strain provide a method of measuring the experimental geometry but imprecise stage movement combined with the high depth of field in the SEM could also result in uncertainties in strain of ∼10−3.

International audience; This comment on the paper "Bragg's Law diffraction simulations for electron backscatter diffraction analysis" by Kacher et al. explains the limitations in determining elastic strains using synthetic EBSD patterns. Of particular importance are those due to the accuracy of determination of the EBSD geometry projection parameters. Additional references and supporting information are provided.

In this chapter we review the progress that has been made toward elastic strain (i.e., stress) mapping using electron backscatter diffraction. In particular we focus on development of an analysis method based on using cross-correlation to determine small shifts in the EBSD patterns with respect to a reference pattern. The pattern shifts are determined at many subregions dispersed across the wide angular span of the EBSD pattern, and the magnitude and angular distribution of shifts allows the strain and rotation tensor to be determined. Pattern shifts at a resolution of ±0.05 pixels, or in some cases even better, have been reported, which corresponds to a sensitivity of ∼±10-4 in the components of the strain and rotation tensor. © Springer Science+Business Media, LLC 2009. All rights reserved.

In this paper, we describe the use of electron back scatter diffraction (EBSD) to study strain variations in crystalline samples at the nanoscale. The analysis relies on cross correlation measurements of small shifts in the EBSD pattern measured at many points dispersed across the pattern. The method allows the full strain tensor, and lattice rotations to be obtained at a sensitivity of ∼10 -4. The method is applied to study variations of strains and rotations near the surface of 200 nm thick epitaxial layers of Si 0.85Ge 0.15 grown on a Si substrate patterned with rectangular and square mesa. Linescans across rectangular mesas show that strain relaxation and accompanying lattice rotations are restricted to the edges of wide mesas but that the relaxation extends across the entirety of mesas narrower than ∼6 μm. Two dimensional maps of the strain variation in a ∼3 μm wide square mesa are also presented. © 2008 Elsevier Ltd. All rights reserved.

Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2006