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• CT kinetics of SO 4 •− and •OH-driven disinfection of fungi and bacteria were established and modeled. • •OH played a more significant role in the PMS/Me(II) disinfection systems than SO 4 •−. • The differences in disinfection resistance between bacteria and fungal spores were compared. • Antioxidant mechanisms and external structures made fungal spores more resistant to radicals attack. Peroxymonosulfate(PMS)-based advanced oxidation process have been recognized as efficient disinfection processes. This study comprehensively investigated the role of sulfate radical (SO 4 •−) and hydroxyl radical (•OH)-driven disinfection of bacteria and fungal spores by the PMS/metals ions (Me(II)) systems and modeled the CT value based on the relationship between survival and ∫ [ Radical ] dt, with the aim to provide an accurate and quantitative kinetic data of inactivation processes. The results indicated that •OH played a more central role than SO 4 •− in the inactivation process, and bacteria were more vulnerable to radical attack than fungal spores due to the differences in antioxidant mechanisms and external structures. The k value of •OH -induced inactivation of E. coli was approximately 3-fold higher than that of A. niger , and the shoulder length of •OH -induced inactivation of E. coli was closely 52-fold shorter than that of A. niger after treated with the PMS/Co(II) system. The morphological and biochemical changes revealed that PMS/Me(II) treatment caused membrane damage, intracellular ROS accumulation and esterase activity loss in microorganisms. This study significantly improved the understanding of the contribution of radicals in the process of microbial inactivation by PMS/Me(II) and would provide important implications for the further development of technologies to cope with the highly resistant fungal spores in drinking water. [Display omitted] [ABSTRACT FROM AUTHOR]