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This paper describes an experimental setup for the deposition of silicon dioxide in a nanoporous material. Nanoporous material was obtained from aluminum, 99.7 % purity. The matrix was impregnated in organic media containing tetraethoxysilane. The obtained product was analyzed using XRD while the diffusion of silicon dioxide was examined using scanning electron microscopy in combination with energy dispersive analysis. The characteristics of the filling of nanoporous materials by chemical precipitation from organic liquid media are considered. Electrophysical characteristics of the obtained composite were studied. Techniques are proposed for improving the occupancy rates of nanoporous inorganic systems with inorganic oxide components. [ABSTRACT FROM AUTHOR]