1. Adjusting hydrophobic and hydrophilic properties by ALD and MLD
- Author
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Putkonen, Matti, Salo, Erkki, Vähä-Nissi, Mika, Sievänen, Jenni, Kenttä, Eija, Sneck, Asko, Nikkola, J., Makkonen, Lasse, Johansson, L.-S., Niinistö, J., Harlin, Ali, and Sajavaara, T.
- Subjects
thin films ,ALD ,surface chemistry - Abstract
Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method
- Published
- 2014