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Abstract: Pulse intensities greater than 1017 Watt/cm2 were reached at the FLASH soft X-ray laser in Hamburg, Germany, using an off-axis parabolic mirror to focus 15 fs pulses of 5–70 μJ energy at 13.5 nm wavelength to a micron-sized spot. We describe the interaction of such pulses with niobium and vanadium targets and their deuterides. The beam produced craters in the solid targets, and we measured the kinetic energy of ions ejected from these craters. Ions with several keV kinetic energy were observed from craters approaching 5 μm in depth when the sample was at best focus. We also observed the onset of saturation in both ion acceleration and ablation with pulse intensities exceeding 1016 W/cm2, when the highest detected ion energies and the crater depths tend to saturate with increasing intensity. A general difficulty in working with micron and sub-micron focusing optics is finding the exact focus of the beam inside a vacuum chamber. Here we propose a direct method to measure the focal position to a resolution better than the Rayleigh length. The method is based on the correlation between the energies of ejected ions and the physical dimensions of the craters. We find that the focus position can be quickly determined from the ion time-of-flight (TOF) data as the target is scanned through the expected focal region. The method does not require external access to the sample or venting the vacuum chamber. Profile fitting employed to analyze the TOF data can extend resolution beyond the actual scanning step size. [Copyright &y& Elsevier]

We report on a single-shot micropatterning of an organic polymer achieved by ablation with demagnifying projection using a plasma-based extreme ultraviolet (XUV) laser at 21 nm. A nickel mesh with a period of 100 μ m was 10×demagnified and imprinted on poly(methyl methacrylate) (PMMA) via direct ablation. This first demonstration of single-shot projection, single-step lithography illustrates the great potential of XUV lasers for the direct patterning of materials with a resolution scalable down to the submicrometer domain. In the second part, we present a novel experimental method for improving the efficiency of surface processing of various solids achieved by simultaneous action of XUV, obtained from high-order harmonic generation, and near-infrared (NIR)-VIS laser pulses. The NIR-VIS pulse interacts with free charge carriers produced by the energetic XUV photons, so that its absorption dramatically increases. Laser-induced periodic surface structures were effectively produced using this technique. [ABSTRACT FROM AUTHOR]

Abstract: The article presents preliminary investigation results on the near-surface damage produced by single pulses of XUV free-electron laser in the amorphous α-SiO2, the monocrystalline silicon and the epitaxial films of gold. The irradiation was delivered with single pulses of only 25fs at a wavelength of 32.5nm and of energy up to 10μJ. Structural modifications induced by irradiation were characterized by X-ray microdiffraction, as well as by the AFM and optical microscopy. Ablation craters of well-defined edges with smooth interiors and outer embankments surrounding the crater edges were found in the materials. Polycrystalline phases were revealed in Si and Au film samples, in the embankments and in central parts of some craters. In α-SiO2, a diffraction pattern typical of an amorphous material was observed without any traces of irradiation-initiated crystallization. A step-like, complete removal of gold film was evidenced inside craters, with only small gold residues in central part of craters exposed to higher fluences. [Copyright &y& Elsevier]