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17 results on '"Pascal Fonteneau"'

1. Sharp switching, hysteresis-free characteristics of Z 2 -FET for fast logic applications

Author

Kyung Hwa Lee, S. Sato, Pascal Fonteneau, H. El Dirani, Sorin Cristoloveanu, Maryline Bawedin, STMicroelectronics [Crolles] (ST-CROLLES), STMicroelectronics [Grenoble] (ST-GRENOBLE), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), and Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])

Subjects
Silicon on insulator, Z2-FET, 02 engineering and technology, Integrated circuit, Hardware_PERFORMANCEANDRELIABILITY, 01 natural sciences, 7. Clean energy, law.invention, law, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Fully Depleted SOI (FDSOI), 010302 applied physics, Physics, business.industry, 021001 nanoscience & nanotechnology, Logic Switch, Subthreshold slope, Anode, Impact ionization, Hysteresis, Dual Ground Planes, Logic gate, Optoelectronics, 0210 nano-technology, business, Dram, band-modulation, Hardware_LOGICDESIGN, Sharp Switch
Abstract

session A4L-F: Emerging Devices and Applications; International audience; A logic switch for integrated circuits is demonstrated experimentally in advanced FDSOI (Fully Depleted SOI). The Z 2 -FET (Zero Impact Ionization and Zero Subthreshold Slope FET) is a band-modulation device that shows remarkable performance in terms of ON/OFF current ratio and sharp switch (~ 1 mV/decade). The Z 2 -FET capability for ESD protection and capacitorless DRAM has already been documented. However, the presence of an inherent hysteresis effect has inhibited so far fast logic applications. A new generation of Z 2 -FETs with single or dual ground-plane has been fabricated with Ultra-Thin Body and Buried Oxide (UTBB) SOI technology. We demonstrate that fast pulses on the gate result in hysteresis-free switching: the device turns ON and OFF at same gate bias. Systematic measurements reveal the key roles of the device parameters and bias on the speed of operation.

Published
2018
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2. A sharp-switching device with free surface and buried gates based on band modulation and feedback mechanisms

Author

Sorin Cristoloveanu, C. Fenouillet-Beranger, Philippe Ferrari, Yohann Solaro, Pascal Fonteneau, Charles-Alexandre Legrand, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), STMicroelectronics [Crolles] (ST-CROLLES), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)

Subjects
Materials science, Z3-FET, Z2-FET, Silicon on insulator, Hardware_PERFORMANCEANDRELIABILITY, 02 engineering and technology, 01 natural sciences, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Materials Chemistry, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Electrical and Electronic Engineering, SOI, 010302 applied physics, business.industry, CMOS, Electrical engineering, Swing, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Impact ionization, Sharp switch, Modulation, Band modulation, Free surface, Optoelectronics, 0210 nano-technology, business, Hardware_LOGICDESIGN
Abstract

We propose and demonstrate experimentally a band-modulation device with extremely sharp switching capability. The Z 3 -FET (Zero gate, Zero swing and Zero impact ionization) has no top gate, is processed with FDSOI CMOS technology, and makes use of two adjacent buried ground planes acting as back gates. The buried gates emulate respectively N + and P + regions in the undoped body, forming a virtual thyristor-like NPNP structure with feedback operation. Vertical output I A – V A and transfer I A – V G characteristics over more than 8 decades of current are measured with relatively low gate and drain bias (

Published
2016
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3. Extended Analysis of the $Z^{2}$ -FET: Operation as Capacitorless eDRAM

Author

Joris Lacord, Campbell Millar, Mukta Singh Parihar, Pascal Fonteneau, Hassan El Dirani, Yong Tae Kim, Sorin Cristoloveanu, Maryline Bawedin, Jean-Charles Barbe, Francisco Gamiz, Noel Rodriguez, Siegfried Karg, Paul Wells, Asen Asenov, Binjie Cheng, Carlos Navarro, M. Duan, Philippe Galy, Cyrille Le Royer, Fikru Adamu-Lema, University of Granada [Granada], Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), James Watt School of Engineering [Univ Glasgow], University of Glasgow, Synopsys Inc., STMicroelectronics [Crolles] (ST-CROLLES), IBM Research Laboratory [Zurich], IBM Research [Zurich], Surecore, Leeds, Korea Advanced Institute of Science and Technology (KAIST), European Project: 687931,H2020,H2020-ICT-2015,REMINDER(2016), and Universidad de Granada = University of Granada (UGR)

Subjects
Engineering, Z²-FET, Z2-FET, 02 engineering and technology, Hardware_PERFORMANCEANDRELIABILITY, eDRAM, Semiconductor memories, 01 natural sciences, fully depleted (FD), 1T-DRAM, Capacitorless, capacitorless, Low-power, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Ground plane, Electrical and Electronic Engineering, Diffusion (business), [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Silicon-on-insulator, 010302 applied physics, lifetime, Hardware_MEMORYSTRUCTURES, business.industry, Reading (computer), ground plane, Electrical engineering, Charge (physics), Feedback effect, 021001 nanoscience & nanotechnology, Electronic, Optical and Magnetic Materials, sharp switch, Fully depleted (FD), Sharp switch, T-Dram, Logic gate, feedback effect, State (computer science), 0210 nano-technology, business, silicon-on-insulator (SOI), Lifetime, Dram
Abstract

This article has been accepted for publication by IEEE "Navarro Moral, C.; et al. Extended analysis of the Z2-FET: Operation as capacitor-less eDRAM. IEEE Transactions on Electron Devices, 64(11): 4486-4491 (2017). DOI: 10.1109/TED.2017.2751141, (c) 2017 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works.", The Z2-FET operation as capacitorless DRAM is analyzed using advanced 2-D TCAD simulations for IoT applications. The simulated architecture is built based on actual 28-nm fully depleted silicon-on-insulator devices. It is found that the triggering mechanism is dominated by the front-gate bias and the carrier’s diffusion length. As in other FB-DRAMs, the memory window is defined by the ON voltage shift with the stored body charge. However, the Z2-FET’s memory state is not exclusively defined by the inner charge but also by the reading conditions.

Published
2017
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4. Ultra-low power 1T-DRAM in FDSOI technology

Author

Gerard Ghibaudo, Sorin Cristoloveanu, H. El Dirani, Yuan Taur, Sebastien Martinie, Kyung Hwa Lee, X. Mescot, Joris Lacord, J.-E. Broquin, Mukta Singh Parihar, Ph. Galy, M. Bawedin, Yong Tae Kim, Francisco Gamiz, Pascal Fonteneau, J-Ch. Barbe, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), STMicroelectronics [Crolles] (ST-CROLLES), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), University of Granada [Granada], Department of Electrical Engineering - University of California, University of California [San Diego] (UC San Diego), University of California-University of California, Korea Advanced Institute of Science and Technology (KAIST), European Project: 687931,H2020,H2020-ICT-2015,REMINDER(2016), Universidad de Granada = University of Granada (UGR), Department of Electrical and Computer Engineering [Univ California San Diego] (ECE - UC San Diego), and University of California (UC)-University of California (UC)

Subjects
Computer science, Z2-FET, 02 engineering and technology, eDRAM, 01 natural sciences, 1T-DRAM, Memory cell, 0103 physical sciences, Electrical and Electronic Engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, ComputingMilieux_MISCELLANEOUS, 010302 applied physics, Ultra low power, business.industry, Electrical engineering, Sense (electronics), 021001 nanoscience & nanotechnology, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Modulation, Sharp switch, State (computer science), Fully Depleted Silicon-On-Insulator (FDSOI), 0210 nano-technology, business, Low-power Embedded memory, Dram, Voltage
Abstract

International audience; A systematic study of a capacitorless 1T-DRAM fabricated in 28 nm FDSOI technology is presented. The operation mechanism is based on band modulation. The Z2-FET memory cell features a large current sense margin and small OFF-state current at 25 °C and 85 °C. Moreover, low power consumption during state ‘1’ writing is achieved with ~ 0.5 V programming voltage. These specifications make the Z2-FET an outstanding candidate for low-power eDRAM applications.

Published
2017
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5. Low-Power Z2-FET Capacitorless 1T-DRAM

Author

Sorin Cristoloveanu, Cyrille Le Royer, Binjie Cheng, Pascal Fonteneau, Mukta Singh Parihar, Sebastien Martinie, Yuan Taur, X. Mescot, Francisco Gamiz, Philippe Galy, Jean-Charles Barbe, M. Bawedin, Kyung Hwa Lee, Carlos Navarro, Joris Lacord, Asen Asenov, Hassan El Dirani, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), University of Granada [Granada], Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Crolles] (ST-CROLLES), Synopsys Inc., James Watt School of Engineering [Univ Glasgow], University of Glasgow, University of California [San Diego] (UC San Diego), University of California, European Project: 687931,H2020,H2020-ICT-2015,REMINDER(2016), Universidad de Granada = University of Granada (UGR), and University of California (UC)

Subjects
010302 applied physics, Engineering, Hardware_MEMORYSTRUCTURES, business.industry, Electrical engineering, 02 engineering and technology, Sense (electronics), 021001 nanoscience & nanotechnology, 01 natural sciences, Anode, Power (physics), Margin (machine learning), Memory cell, Logic gate, 0103 physical sciences, Electronic engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, Dram, Voltage
Abstract

session FRAM and DRAM; International audience; This work highlights the features of Z2-FET capacitorless 1T-DRAM describing its operation in detail. The Z2-FET memory cell fabricated with FDSOI technology delivers large current sense margin along with long retention time at room temperature. Numerous measurements confirm that the demonstrated 1T-DRAM is able to achieve attractive current margin even with 0.5 V programming voltage. For this case, the power consumption is also reduced by restricting the writing current. Abovementioned merits along with significantly small OFF-state current makes this device a suitable candidate for low power embedded DRAM applications.

Published
2017
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6. The mystery of the Z 2 -FET 1T-DRAM memory

Author

Kyung Hwa Lee, Sebastien Martinie, Francisco Gamiz, X. Mescot, H. El Dirani, Ph. Galy, Binjie Cheng, Sorin Cristoloveanu, Carlos Navarro, Joris Lacord, M. Bawedin, Mukta Singh Parihar, C. Le Royer, Asen Asenov, Pascal Fonteneau, Yuan Taur, J.-Ch. Barbe, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Grenoble] (ST-GRENOBLE), STMicroelectronics [Crolles] (ST-CROLLES), University of Granada [Granada], James Watt School of Engineering [Univ Glasgow], University of Glasgow, Department of Electrical Engineering - University of California, University of California [San Diego] (UC San Diego), University of California-University of California, European Project: 687931,H2020,H2020-ICT-2015,REMINDER(2016), Universidad de Granada = University of Granada (UGR), Department of Electrical and Computer Engineering [Univ California San Diego] (ECE - UC San Diego), and University of California (UC)-University of California (UC)

Subjects
010302 applied physics, SOI, Random access memory, Hardware_MEMORYSTRUCTURES, carrier lifetime, Computer science, band modulation, Silicon on insulator, Z2-FET, 02 engineering and technology, 021001 nanoscience & nanotechnology, Memory performance, 01 natural sciences, Modulation, Logic gate, 0103 physical sciences, Electronic engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, Dram memory
Abstract

session 4: Memory Devices; International audience; We review the operation mechanisms of the Z 2 -FET underlining its attractiveness as a capacitorless DRAM memory. The main parameters that govern the memory performance are discussed based on systematic experiments and simulations.

Published
2017
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7. Sharp-switching band-modulation back-gated devices in advanced FDSOI technology

Author

Charles-Alex Legrand, Philippe Ferrari, D. Marin-Cudraz, Sorin Cristoloveanu, Yohann Solaro, Hassan El Dirani, Pascal Fonteneau, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), and STMicroelectronics [Crolles] (ST-CROLLES)

Subjects
010302 applied physics, Materials science, Silicon, business.industry, Doping, chemistry.chemical_element, Low leakage, 02 engineering and technology, Swing, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Electronic, Optical and Magnetic Materials, Impact ionization, chemistry, Modulation, 0103 physical sciences, Materials Chemistry, Optoelectronics, High current, Electrical and Electronic Engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, Voltage
Abstract

International audience; A band-modulation device with a free top surface, named Z3-FET (Zero front-gate, Zero swing slope and Zero impact ionization) and fabricated in the most advanced Fully Depleted Silicon-On-Insulator technology, is demonstrated experimentally. Since the device has no front gate, the operation mechanism is controlled by two adjacent heavily doped buried ground planes acting as back-gates. Characteristics such as sharp quasi-vertical switching, low leakage, and tunable trigger voltage are measured and discussed. We explore several variants (thin and thick silicon or SiGe body) and show promising results in terms of high current, switching performance and ESD capability with relatively low back-gate and drain bias operation.

Published
2017
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8. Z2-FET as Capacitor-Less eDRAM Cell For High-Density Integration

Author

Cyrille Le Royer, Kyung Hwa Lee, Siegfried Karg, Jean-Charles Barbe, Maryline Bawedin, Pascal Fonteneau, Campbell Millar, Carlos Navarro, Sorin Cristoloveanu, Carlos Sampedro, Paul Wells, Fikru Adamu-Lema, Asen Asenov, Mukta Singh Parihar, Stefan Coseman, Philippe Galy, Seong Il Kim, Hassan El Dirani, Yong Tae Kim, Joris Lacord, Francisco Gamiz, Binjie Cheng, M. Duan, Heike Riel, University of Granada [Granada], James Watt School of Engineering [Univ Glasgow], University of Glasgow, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Surecore, Leeds, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Synopsys Inc., STMicroelectronics [Crolles] (ST-CROLLES), Department of Electrical Engineering [Korea Advanced Institute of Science and Technology] (KAIST), Korea Advanced Institute of Science and Technology (KAIST), IBM Research Laboratory [Zurich], IBM Research [Zurich], IBM Zurich Research Laboratory, IBM, European Project: 687931,H2020,H2020-ICT-2015,REMINDER(2016), and Universidad de Granada = University of Granada (UGR)

Subjects
Silicon on insulator, Z2-FET, integration, 02 engineering and technology, eDRAM, Topology, 01 natural sciences, fully depleted (FD), law.invention, 1T-DRAM, Capacitorless, law, Low-power electronics, 0103 physical sciences, Electronic engineering, Electrical and Electronic Engineering, embedded, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Scaling, silicon on insulator (SOI) and Z²-FET, 010302 applied physics, Physics, Bit cell, Dynamic random-access memory, low power, scaling, 021001 nanoscience & nanotechnology, capacitor less, Electronic, Optical and Magnetic Materials, Capacitor, DRAM, Fully depleted (FD), Logic gate, 0210 nano-technology, 1T-dynamic random access memory (DRAM)
Abstract

2-D numerical simulations are used to demonstrate the Z2-FET as a competitive embedded capacitorless dynamic random access memory cell for low-power applications. Experimental results in 28-nm fully depleted silicon on insulator technology are used to validate the simulations prior to downscaling tests. Default scaling, without any structure optimization, and enhanced scaling scenarios are considered before comparing the bit cell area consumption and integration density with other eDRAM cells in the literature., 2016 REMINDER project (grant agreement No 687931) is thanked for financial support

Published
2017
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9. A band-modulation device in advanced FDSOI technology: Sharp switching characteristics

Author

Sorin Cristoloveanu, Pascal Fonteneau, Hassan El Dirani, Yohann Solaro, Philippe Ferrari, Dominique Golanski, Charles-Alex Legrand, D. Marin-Cudraz, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), and STMicroelectronics [Crolles] (ST-CROLLES)

Subjects
010302 applied physics, Materials science, business.industry, Silicon on insulator, 02 engineering and technology, Electron, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, 7. Clean energy, Subthreshold slope, Buried oxide, Electronic, Optical and Magnetic Materials, Impact ionization, Modulation, 0103 physical sciences, Materials Chemistry, Optoelectronics, Node (circuits), Electrical and Electronic Engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, Voltage
Abstract

International audience; A band-modulation device is demonstrated experimentally in advanced FDSOI (Fully Depleted SOI). The Z2-FET (Zero Impact Ionization and Zero Subthreshold Slope FET) is a very recent sharp switching device which achieves remarkable performance in terms of leakage current and triggering control. The device is fabricated with Ultra-Thin Body and Buried Oxide (UTBB) Silicon-On-Insulator (SOI) technology, features an extremely sharp on-switch, low leakage and an adjustable triggering voltage (VON). The Z2-FET operation relies on the modulation of electrons and holes injection barriers. In this paper, we show, for the first time, experimental data obtained with the most advanced FDSOI node.

Published
2016
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10. Competitive 1T-DRAM in 28 nm FDSOI technology for low-power embedded memory

Author

Francisco Gamiz, P. Ferrari, Sorin Cristoloveanu, Ph. Galy, H. El Dirani, Pascal Fonteneau, X. Mescot, Kyung Hwa Lee, M. Bawedin, Mukta Singh Parihar, Y-T. Kim, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), STMicroelectronics [Crolles] (ST-CROLLES), Universidad de Granada = University of Granada (UGR), The Korean Institute of Science and Technology, European Project: 687931,H2020,H2020-ICT-2015,REMINDER(2016), and University of Granada [Granada]

Subjects
low-power, Materials science, Silicon on insulator, Z2-FET, 02 engineering and technology, 01 natural sciences, law.invention, 1T-DRAM, Memory cell, law, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 010302 applied physics, SOI, business.industry, Electrical engineering, Sense (electronics), 021001 nanoscience & nanotechnology, Cathode, FDSOI, Anode, Capacitor, Logic gate, Optoelectronics, 0210 nano-technology, business, Dram
Abstract

session poster; International audience; We demonstrate experimentally a capacitorless IT-DRAM fabricated with 28 nm FDSOI. The Z 2 -FET memory cell features a large current sense margin and long retention time at T = 25°C and 85°C. Systematic measurements show that Z 2 -FET exhibits negligible OFF-state current at low drain/gate bias and is suitable as a low-power embedded memory.

Published
2016
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11. Novel FDSOI band-modulation device: Z 2 -FET with Dual Ground Planes

Author

H. El Dirani, Yohann Solaro, Sorin Cristoloveanu, P. Ferrari, Pascal Fonteneau, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), STMicroelectronics [Crolles] (ST-CROLLES), and European Project: 662175,H2020,ECSEL-2014-2,WAYTOGO FAST(2015)

Subjects
Materials science, Silicon on insulator, 02 engineering and technology, 01 natural sciences, 1T-DRAM, 0103 physical sciences, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Electro-Static Discharge (ESD), Fully Depleted SOI (FDSOI), 010302 applied physics, business.industry, Hysteresis, Electrical engineering, Zero Impact Ionization and Zero Subthreshold Slope FET, 021001 nanoscience & nanotechnology, Subthreshold slope, Anode, Impact ionization, Modulation, Dual Ground Planes, Logic gate, Ultra-Thin Body and BOX (UTBB), Optoelectronics, 0210 nano-technology, business, Voltage, Sharp Switch
Abstract

session A5L-C: Novel Devices; International audience; A novel sharp switching Z 2 -FET DGP device (Zero Impact Ionization and Zero Subthreshold Slope FET with Dual Ground Planes) relying on band modulation mechanism is presented in this paper. The device is fabricated in the most advanced FDSOI (Fully Depleted SOI) technology with Ultra-Thin Body and Buried Oxide (UTBB). The Z 2 -FET DGP is an upgraded version of Z 2 -FET. It features sharp on-switch, adjustable triggering voltage (Vt1), and wide hysteresis useful for 1T-DRAM memory.

Published
2016
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12. A sharp-switching gateless device (Z3-FET) in advanced FDSOI technology

Author

Sorin Cristoloveanu, Yohann Solaro, H. El Dirani, P. Ferrari, D. Marin-Cudraz, Charles-Alexandre Legrand, Dominique Golanski, Pascal Fonteneau, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), STMicroelectronics [Crolles] (ST-CROLLES), and European Project: 662175,H2020,ECSEL-2014-2,WAYTOGO FAST(2015)

Subjects
Materials science, Silicon, chemistry.chemical_element, Low leakage, 02 engineering and technology, Hardware_PERFORMANCEANDRELIABILITY, 01 natural sciences, Zero Gate and Zero subthreshold slope FET (Z3-FET), 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Zero Impact Ionization, High current, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Electro-Static Discharge (ESD), 010302 applied physics, business.industry, Swing, 021001 nanoscience & nanotechnology, Impact ionization, chemistry, Modulation, Optoelectronics, Fully Depleted Silicon-On-Insulator (FDSOI), 0210 nano-technology, business, Hardware_LOGICDESIGN, Sharp Switch
Abstract

session 9: Advanced Devices ad Three-Dimensional Integration; International audience; A systematic study of a novel band modulation device (Z3-FET: Zero gate, Zero swing slope and Zero impact ionization) fabricated in most advanced Fully Depleted Silicon-On-Insulator technology is presented. Since the device has no front gate, the operation mechanism is controlled by two buried ground planes. Characteristics such as sharp switching, low leakage, and controllable triggering are measured and discussed. We explore several variants (thin and thick silicon film) and show promising results in terms of high current and switching performance.

Published
2016
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13. Properties and mechanisms of Z2-FET at variable temperature

Author

Hassan El Dirani, Sorin Cristoloveanu, Pascal Fonteneau, Yohann Solaro, Philippe Ferrari, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), and STMicroelectronics [Crolles] (ST-CROLLES)

Subjects
Materials science, Silicon on insulator, 02 engineering and technology, Electron, Hardware_PERFORMANCEANDRELIABILITY, 01 natural sciences, Buried oxide, law.invention, law, 0103 physical sciences, Materials Chemistry, Hardware_INTEGRATEDCIRCUITS, Electrical and Electronic Engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 010302 applied physics, business.industry, Transistor, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Impact ionization, Modulation, Subthreshold swing, Optoelectronics, 0210 nano-technology, business, Voltage, Hardware_LOGICDESIGN
Abstract

International audience; This paper presents a systematic study of Z2-FET (Zero Subthreshold Swing and Zero Impact Ionization transistor) fabricated in advanced Fully Depleted Silicon On Insulator (FDSOI) 28 nm technology with Ultra-Thin Body and Buried Oxide (UTBB). It is a recent sharp-switching device that achieves remarkable performance in terms of leakage current and triggering control. The device features an extremely sharp on-switch, an adjustable triggering voltage (VON), and is considered for Electro-Static Discharge (ESD) protection. The operation principle relies on the modulation of electrons and holes injection barriers. Experimental results show the effect of low and high temperature on the output characteristics, triggering voltage and leakage current. Previous article in issue

Published
2016
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14. Sharp-switching Z2-FET device in 14 nm FDSOI technology

Author

Pascal Fonteneau, P. Ferrari, H. El Dirani, Sorin Cristoloveanu, and Yohann Solaro

Subjects
010302 applied physics, Materials science, Silicon, business.industry, chemistry.chemical_element, Silicon on insulator, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 7. Clean energy, Subthreshold slope, Impact ionization, chemistry, Modulation, Logic gate, 0103 physical sciences, Optoelectronics, Node (circuits), 0210 nano-technology, business, Voltage
Abstract

Z2-FET (Zero Impact Ionization and Zero Subthreshold Slope FET) is a very recent sharp switching device which achieves remarkable performance in terms of leakage current and triggering control. The device is fabricated with Ultra-Thin Body and Buried Oxide (UTBB) Silicon-On-Insulator (SOI) technology, features an extremely sharp on-switch, an adjustable triggering voltage (V ON ), and can be considered for Electro-Static Discharge (ESD). The operation of our device relies on the modulation of electrons and holes injection barriers. In this paper, we show, for the first time, experimental data obtained on the 14 nm FDSOI (Fully Depleted SOI) node.

Published
2015
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15. Thickness characterization by capacitance derivative in FDSOI p-i-n gated diodes

Author

Carlos Navarro, Maryline Bawedin, Y. Solaro, Sorin Cristoloveanu, Jacques Cluzel, Pascal Fonteneau, Frédéric Martinez, B. Sagnes, Francois Andrieu, Institut d’Electronique et des Systèmes (IES), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Micro électronique, Composants, Systèmes, Efficacité Energétique (M@CSEE), Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Inst National Polytechnique de Grenoble (INPG), Institut National Polytechnique de Grenoble (INPG), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Grenoble] (ST-GRENOBLE), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National Polytechnique de Grenoble (INPG)-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS), and Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)

Subjects
010302 applied physics, Materials science, Silicon, Differential capacitance, business.industry, chemistry.chemical_element, Silicon on insulator, 02 engineering and technology, Electron, 021001 nanoscience & nanotechnology, 01 natural sciences, Capacitance, Threshold voltage, [SPI.TRON]Engineering Sciences [physics]/Electronics, [SPI]Engineering Sciences [physics], chemistry, 0103 physical sciences, Optoelectronics, Transient (oscillation), 0210 nano-technology, business, Diode
Abstract

International audience; The SOI structural characterization is addressed in this paper by using split capacitance measurements on p-i-n gated diodes. The p+ and n+ contacts supply promptly electrons and holes in the body, preventing the diode from the parasitic transient effects that undermine the capacitance measurements in SOI MOSFETs. A novel method to determine the silicon film thickness, based on the capacitance derivative, is presented and validated by experiments and TCAD simulations.

Published
2015
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16. Z2-FET: A promising FDSOI device for ESD protection

Author

Claire Fenouillet-Beranger, Alexander Zaslavsky, Cyrille Le Royer, Jing Wan, Sorin Cristoloveanu, Yohann Solaro, Pascal Fonteneau, Philippe Ferrari, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National Polytechnique de Grenoble (INPG)-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS), STMicroelectronics [Crolles] (ST-CROLLES), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), School of Engineering (Brown Engineering), Brown University, and Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)

Subjects
010302 applied physics, Engineering, business.industry, Electrical engineering, Low leakage, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 7. Clean energy, 01 natural sciences, Buried oxide, Electronic, Optical and Magnetic Materials, Impact ionization, Modulation, Subthreshold swing, 0103 physical sciences, Materials Chemistry, Electrical and Electronic Engineering, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, Voltage
Abstract

International audience; In this work, the use of the Z2-FET (Zero subthreshold swing and Zero impact ionization FET) for Electro-Static Discharge (ESD) protections is demonstrated. The device, fabricated with Ultra-Thin Body and Buried Oxide (UTBB) Silicon-On-Insulator technology, features an extremely sharp off-on switch and an adjustable triggering voltage (Vt1). The principle of operation, relying on the modulation of electron and hole injection barriers, is reviewed. The impact of process modules and design parameters on electrical characteristics is analyzed with TCAD simulations, showing that very low leakage current (Ileak) and triggering capability adapted to local protection schemes are achievable. Experimental results validate the possible use of this device as an ESD protection in the 28 nm FDSOI technology.

Published
2014
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17. A review of the Z 2 -FET 1T-DRAM memory: Operation mechanisms and key parameters

Author

Kyung Hwa Lee, H. El Dirani, Sorin Cristoloveanu, Mukta Singh Parihar, J.-Ch. Barbe, Jing Wan, Yong Tae Kim, X. Mescot, Sebastien Martinie, Yuan Taur, Francisco Gamiz, Pascal Fonteneau, Yong Xu, Ph. Galy, Binjie Cheng, M. Bawedin, M. Duan, C. Le Royer, Fikru Adamu-Lema, Carlos Navarro, Joris Lacord, Asen Asenov, Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Crolles] (ST-CROLLES), Universidad de Granada = University of Granada (UGR), University of Glasgow, James Watt School of Engineering [Univ Glasgow], Department of Electrical and Computer Engineering [Univ California San Diego] (ECE - UC San Diego), University of California [San Diego] (UC San Diego), University of California (UC)-University of California (UC), Nanjing University of Posts and Telecommunications [Nanjing] (NJUPT), The Korean Institute of Science and Technology, Fudan University [Shanghai], European Project: 687931,H2020,H2020-ICT-2015,REMINDER(2016), University of Granada [Granada], Department of Electrical Engineering - University of California, and University of California-University of California

Subjects
010302 applied physics, Hardware_MEMORYSTRUCTURES, Computer science, Silicon on insulator, Embedded memory, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Electronic, Optical and Magnetic Materials, Margin (machine learning), 0103 physical sciences, Materials Chemistry, Key (cryptography), Electronic engineering, Hardware_INTEGRATEDCIRCUITS, High current, Electrical and Electronic Engineering, Operating voltage, Current (fluid), [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, Dram memory
Abstract

International audience; The band-modulation and sharp-switching mechanisms in Z2-FET device operated as a capacitorless 1T-DRAM memory are reviewed. The main parameters that govern the memory performance are discussed based on detailed experiments and simulations. This 1T-DRAM memory does not suffer from super-coupling effect and can be integrated in sub-10 nm thick SOI films. It offers low leakage current, high current margin, long retention, low operating voltage especially for programming, and high speed. The Z2-FET is suitable for embedded memory applications.

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