1. Near-field sub-diffraction photolithography with an elastomeric photomask
- Author
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Jae Min Myoung, Gwangmook Kim, Jinwoo Cheon, Hongjae Moon, Jaejun Lee, Hyun Jae Kim, Kwang-Yong Jeong, Wooyoung Lee, Jeongmin Moon, Jekwan Lee, Kiseok Chang, Sooun Lee, I. Sak Lee, Miso Kim, Hyunyong Choi, Soonshin Jung, Shinill Kang, Sangyoon Paik, Su Seok Choi, Jae Hyun Lee, Wooyoung Shim, Sehwan Chang, Heon Jin Choi, Hong Gyu Park, and Dana Jin
- Subjects
Diffraction ,Lithography ,Computer science ,Science ,General Physics and Astronomy ,Near and far field ,02 engineering and technology ,010402 general chemistry ,01 natural sciences ,Article ,General Biochemistry, Genetics and Molecular Biology ,law.invention ,Robustness (computer science) ,law ,lcsh:Science ,Multidisciplinary ,Surface patterning ,business.industry ,General Chemistry ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,Mercury-vapor lamp ,Light intensity ,Design, synthesis and processing ,Optoelectronics ,lcsh:Q ,Photolithography ,Photomask ,0210 nano-technology ,business ,Microfabrication - Abstract
Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10th of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions., Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a cost effective near-field optical printing approach.
- Published
- 2020