1. Hot-Carrier Degradation Estimation of a Silicon-on-Insulator Tunneling FET Using Ambipolar Characteristics
- Author
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Donghwan Lim, Soo Cheol Kang, Chang Hwan Choi, Byoung Hun Lee, Sang Kyung Lee, Dong-Seon Lee, and Seokjin Kang
- Subjects
010302 applied physics ,Materials science ,business.industry ,Ambipolar diffusion ,Transistor ,Oxide ,Silicon on insulator ,01 natural sciences ,Electronic, Optical and Magnetic Materials ,law.invention ,Stress (mechanics) ,chemistry.chemical_compound ,chemistry ,law ,0103 physical sciences ,Optoelectronics ,Degradation (geology) ,Electrical and Electronic Engineering ,business ,Layer (electronics) ,Quantum tunnelling - Abstract
The unique degradation behavior of a tunneling field-effect transistor (TFET) under hot-carrier injection (HCI) stress has been previously investigated. However, while the source side (p+/p junction) of degradation (due to HCI stress) has been extensively studied, the drain side (p/n+ junction) has not been investigated yet. Our study revealed that both bulk oxide and interfacial layer degradation occurred at the drain side, while an interfacial layer degradation was dominant at the source side at 300 K. This evidences a unique degradation mechanism of the tunneling FET.
- Published
- 2019
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