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The results of a study of the unoccupied electronic states of ultrathin films of bis-carboxyphenyl-phthalide (DCA-DPP) and bis-methylphenyl-phthalide (DM-DPP) up to 8 nm thick are presented. The studies are carried out by total current spectroscopy (TCS) in the energy range from 5 to 20 eV above EF during thermal vacuum deposition of these organic films on the surface of highly ordered pyrolytic graphite (HOPG). The values of Evac relative to EF, i.e., the work function of electrons of the DM-DPP films at a film thickness of 5–8 nm are found to be 4.3 ± 0.1 eV. The values of the work function of electrons of the DCA‑DPP films are found to be 3.7 ± 0.1 eV. The structure of the maxima of unoccupied electronic states of DCA-DPP and DM-DPP films in the studied energy range is established. A comparison of the obtained properties of DCA-DPP and DM-DPP films with the properties of films of molecules of unsubstituted diphenylphthalide (DPP) is presented. Thus, the –CH3 substitution of the DPP molecule has almost no effect on the height of the potential barrier between the film and the HOPG surface, while –COOH substitution of the DPP molecule leads to an increase in the height of the potential barrier between the film and the HOPG substrate surface by 0.5–0.6 eV. Substitution of DPP molecules with –COOH functional groups and, thus, the formation of DCA-DPP molecules lead to a shift of two maxima of the fine structure of the total current spectra located at energies in the range from 5 to 8 eV above EF by about 1 eV towards the lower electron energies.

A comparative study has been performed for the structures of the maxima of the density of unoccupied electronic states (DOUS) in ultrathin films of the naphthalene-1,4,5,8-tetracarboxyl acid dianhydride (NTCDA) and naphthalene-1,8-dicarboxyl acid anhydride (NDCA) and two types of films based on phthalides: 3,3-diphenylphthalide (DPP) and 3,3-diphenylphthalide-4',4'-dicarboxyl acid (DPP–DCA). The structures of unoccupied electronic states of the 8–10-nm-thick films have been measured by total current spectroscopy (TCS) in the energy range from 5 to 20 eV above the Fermi level. The experimental results are analyzed by constructing the model total current spectra and the DOUS dependences using the results of calculation of the orbital energy of the molecules under study by the density functional theory (DFT) at the B3LYP/6-31G(d) level. The difference in the DOUS spectra of the NTCDA and NDCA films is the shift of the main DOUS maxima of the NTCDA film to lower energies approximately by 1 eV at energies lower than 12.5 eV; at higher energies, the DOUS maxima are shifted by 1.5–2 eV. The energy positions of the maxima of the total current spectra of the DPP–DCA and DPP films are changed only slightly as various substrates are used: highly ordered pyrolitic graphite (HOPG) and a CdS deposited layer-by-layer. The relative intensities of the maxima are different as various substrates are used. The characteristic shifts of the maxima of the total current spectra of the DPP–DCA films are approximately 1 eV at energies lower 12.5 eV above the Fermi level and 1.5–2 eV at higher energies, as compared to the positions of the corresponding maxima of the DPP films.

The formation of unoccupied electronic states and the boundary potential barrier during thermal deposition of tetracyanoquinodimethane (TCNQ) films to 7 nm in thickness on a (SiO2)n-Si surface has been studied. The electronic characteristics of the surface under study are measured by the total current spectroscopy (TCS) using a testing electron beam with energies from 5 to 20 eV above the Fermi level. The formation of a boundary potential barrier in the (SiO2)n-Si/TCNQ structure is accompanied by an increase in the work function of the surface from 4.2 ± 0.1 to 4.7 ± 0.1 eV. Using the results of the TCS experiments, the DOUS dependences of the TCNQ films have been built. To analyze the experimental DOUS dependences, the orbital energies of the TCNQ molecules are calculated by the density functional theory (DFT) at the B3LYP/6-31G(d) level with subsequent correction and the inclusion of the polarization energy of the condensed medium. In the energy range indicated above, DOUS of the TCNQ films has four main maxima. The DOUS maximum at energy 7.0 eV above EF is predominantly formed by π* orbitals. Three DOUS maxima in the energy range from 8.0 to 20 eV above EF are formed by approximately the same amount of the π* and σ* orbitals.

The atomic composition of films of a polyphenol antioxidant, namely, resveratrol (RVL), with a thickness of up to 50 nm thermally deposited on an oxidized silicon surface is studied by the method of X-ray photoelectron spectroscopy (XPS). It is found that the surface area of pores in the RVL film is about 15% of the total surface area. The results of studying the stability of the RVL films when their surface is treated with Ar+ ions of 3 keV under the electric current of 1 μA passing through the sample for 30 s are given. The treatment gives rise to an increase in the area of pores to 30–40%, while the ratio of the concentration of C atoms to the concentration of O atoms in the RVL film both before and after the treatment of the surface with ions does not correspond to the chemical formula of RVL molecules. Using the method of atomic force microscopy (AFM) in contact mode with a scanning area size of about 10 × 10 μm, RVL coatings deposited on the oxidized silicon and polycrystalline Au surfaces are studied. It is found that the RVL films produce grainy and porous coatings on the substrate surfaces. The typical size of grains in the sample surface plane is 150–300 nm, and the characteristic elevation reaches 30 nm.

The unoccupied electron states and the boundary potential barrier during deposition of ultrathin films of dimethyl-substituted thiophene–phenylene coolygomers of the type of CH3–phenylene–thiophene–thiophene–phenylene–CH3 (CH3–PTTP–CH3) on an oxidized silicon surface have been studied. The electronic characteristics have been measured in the energy range from 5 to 20 eV above the Fermi level using total current spectroscopy (TCS). The structure of the CH3–PTTP–CH3 film surfaces has been studied by atomic force microscopy (AFM), and the atomic compositions of the films have been studied by X-ray photoelectron spectroscopy (XPS). The changes in the maximum intensities measured by the TCS method obtained from the deposited CH3–PTTP–CH3 film and from the substrate during increasing in the organic coating thickness to 6 nm is discussed. The formation of the boundary potential barrier in the n-Si/SiO2/CH3–PTTP–CH3 is accompanied by the decrease in the surface work function from 4.2 ± 0.1 to 4.0 ± 0.1 eV as the organic coating thickness increases to 3 nm. The ratio of atomic concentrations C: S in the CH3–PTTP–CH3 films well corresponds to the chemical formula of CH3–PTTP–CH3 molecules. The roughness of the CH3–PTTP–CH3 coating surface was not higher than 10 nm on the ~10 × 10 μm areas as the total CH3–PTTP–CH3-layer thickness was about 100 nm.

The results of examination of the electronic structure of the conduction band of naphthalenedicarboxylic anhydride (NDCA) films in the process of their deposition on the surface of oxidized silicon are presented. These results were obtained using total current spectroscopy (TCS) in the energy range from 5 to 20 eV above the Fermi level. The energy position of the primary maxima of the density of unoccupied states (DOUS) of an NDCA film was determined based on the experimental TCS data and calculated data and compared with the position of the DOUS maxima of a naphthalenetetracarboxylic dianhydride (NTCDA) film. The theoretical analysis involved calculating the energies and the spatial distribution of orbitals of the molecules under study at the B3LYP/6-31G(d) DFT (density functional theory) level and correcting the obtained energies in accordance with the procedure that was proven effective in earlier studies of the conduction band of films of small conjugated organic molecules. It was found that the DOUS maxima of the NTCDA film in the studied energy interval from 5 to 20 eV above the Fermi level are shifted toward lower electron energies by 1–2 eV relative to the corresponding DOUS maxima of the NDCA film Subdivision of the Ufa Federal Research Centre of the.

The results of the investigation of the density of unoccupied electronic states (DOUS) in the energy range from 5 to 20 eV above the Fermi level (E F) in dioctyl-substituted perylenedicarboximide (PTCDI-C8) and diphenyl-substituted perylenedicarboximide (PTCDI-Ph) ultrathin films have been presented. The experimental results have been obtained from measurements of the secondary low-energy electron current with the use of the total current spectroscopy (TCS) technique. A theoretical analysis has been performed, including the density functional theory calculation of the energies and spatial distribution of the orbitals of the molecules under investigation and the subsequent scaling of the calculated orbital energies according to the procedure well-proven previously in studies of small conjugated organic molecules. It has been found that, for each of the two types of the studied films, at energies below 8 eV above the Fermi level E F, there are two main maxima of the density of unoccupied electronic states predominantly formed by the π*-orbitals of the molecules. The higher-lying maxima have essentially a σ*-character. The influence of dioctyl- and diphenyl-substituent groups on the density of unoccupied electronic states has been analyzed in comparison with the results obtained for the studied types of films. In the case of the π*-maxima, the relative shift has been observed at an energy of approximately 1 eV. In the region of σ*-electronic states, there is a small transformation of the structure of the maxima.

The interface chemical reactions, the deoxygenation and the overall thermal stability of the ex situ deposited graphene oxide (GO) thick film on the polycrystalline tantalum surface were studied by means of x-ray photoelectron spectroscopy (XPS) at room temperature and after annealing up to 600 °С. The evolution of the Ta4f, C1s and O1s XPS core level spectra from the Ta/GO structure under study upon the increase of the annealing temperature was investigated with the reference to the uncovered Ta substrate surface. In the Ta/GO structure the Ta relative atomic concentration was about 1% at room temperature due to the low porosity of the GO layer while the thermal desorption of the overlayer at the elevated temperatures was accompanied by an increase of the Ta concentration up to 47% at 500 °С. The C atoms relative concentration started decreasing after the annealing at 250 °С accompanying the thermal desorption of the GO overlayer. The formation of the TaC compound starting from the 250 °С annealing temperatures was determined. The relative oxygen concentration in the GO thick film was decreased upon increasing the annealing temperature accompanying both the thermal desorption of the GO material and the thermal reduction of the GO film. Keywords: Graphene oxide, Tantalum oxide, Surfaces and interfaces, Thermal treatment, X-ray photoelectron spectroscopy

The atomic composition and the electronic properties of ultrathin films of the four-conjugated rings thiophene/phenylene co-oligomers end-terminated by the −CH 3 and by the -CF 3 radicals vacuum deposited onto the oxidized silicon surface were studied using the X-ray photoelectron spectroscopy (XPS) and total current spectroscopy (TCS) techniques. The relative concentrations of the C, S and F atoms measured from the film deposits were evaluated and were found to correspond to the chemical formulae of the CH 3 -phenylene-thiophene-thiophene-phenylene−CH 3 (CH 3 -PTTP−CH 3 ) and CF 3 -phenylene-thiophene-thiophene-phenylene-CF 3 (CF 3 -PTTP-CF 3 ) molecules studied. The TCS measurements during the increase of the organic layer thickness up to 6 nm on a (SiO 2 )n-Si substrate were used to determine the conduction band peak structure related to the density of the unoccupied electronic states (DOUS) in the range from 5 eV to 22 eV above E F . DOUS of the films investigated was also obtained theoretically by means of ab initio calculations. According to the calculations, the energy position of the lowest unoccupied molecular orbital (LUMO) peak was found at 4.4 eV in the case of the CH 3 -PTTP−CH 3 film and at 3.9 eV in the case of the CF 3 -PTTP-CF 3 film. The effect of fluorine substitution on the DOUS was determined as approximately 2 eV peak shift towards low electron energies in the case of the CF 3 -PTTP-CF 3 film compared to the case of the CH 3 -PTTP−CH 3 film in the electron energy range from 10 eV to 22 eV above E F and as a more complex peak restructuring in the energy range from 5 eV to 10 eV above E F . The DOUS peaks of the two films studied were assigned to molecular orbitals with π* character in the 5–9.5 eV energy range and molecular orbitals with σ* character in the 9.5–22 eV energy range above E F .

The results of the investigation of the electronic structure of the conduction band and the interfacial potential barrier during the formation of interfaces of dioctyl-substituted perylenedicarboximide (PTCDI-C8) and diphenyl-substituted perylenedicarboximide (PTCDI-Ph) ultrathin films with the oxidized germanium surface have been presented. The experimental results have been obtained using the very low energy electron diffraction (VLEED) technique in the total current spectroscopy (TCS) mode at energies in the range from 5 to 20 eV above the Fermi level EF. The positions of the maxima of the fine structure of total current spectra (FSTCS) of the PTCDI-C8 and PTCDI-Ph films differ significantly in the energy range from 9 to 20 eV above the Fermi level EF, which can be associated with the difference between the substituents of the chosen molecules, dioctyl- and diphenyl-, respectively. At the same time, the positions of the lowenergy maxima in the FSTCS spectra at an energy 6–7 eV above the Fermi level EF for the PTCDI-C8 and PTCDI-Ph films almost coincide with each other. It has been suggested that these maxima are attributed to the electronic states of the perylene core of the molecules under investigation. The process of the formation of interfacial potential barriers of the PTCDI-C8 and PTCDI-Ph films with the oxidized germanium surface has been analyzed. It has been found that the work functions of the surface, Evac–EF, differ little from 4.6 ± 0.1 eV over the entire range of organic coating thicknesses from 0 to 6 nm.

The results of the investigation of the electronic structure of the conduction band in the energy range 5–25 eV above the Fermi level E F and the interfacial potential barrier upon deposition of aziridinylphenylpyrrolofullerene (APP-C60) and fullerene (C60) films on the surface of the real germanium oxide ((GeO2)Ge) have been presented. The content of the oxide on the (GeO2)Ge surface has been determined using X-ray photoelectron spectroscopy. The electronic properties have been measured using the very low energy electron diffraction (VLEED) technique in the total current spectroscopy (TCS) mode. The regularities of the change in the fine structure of total current spectra (FSTCS) with an increase in the thickness of the APP-C60 and C60 coatings to 7 nm have been investigated. A comparison of the structures of the FSTCS maxima for the C60 and APP-C60 films has made it possible to reveal the energy range (6–10 eV above the Fermi level E F) in which the energy states are determined by both the π* and σ* states and the FSTCS spectra have different structures of the maxima for the APP-C60 and unsubstituted C60 films. The formation of the interfacial potential barrier upon deposition of APP-C60 and C60 on the (GeO2)Ge surface is accompanied by an increase in the work function of the surface E vac–E F by the value of 0.2–0.3 eV, which corresponds to the transfer of the electron density from the substrate to the organic films under investigation. The largest changes occur with an increase in the coating thickness to 3 nm, and with further deposition of APP-C60 and C60, the work function of the surface changes only slightly.

This paper presents the results of the investigation of the interface potential barrier and vacant electronic states in the energy range of 5 to 20 eV above the Fermi level (EF) in the deposition of perylene tetracarboxylic dianhydride (PTCDA) films on the oxidized germanium surface ((GeO2)Ge). The concentration of oxide on the (GeO2)Ge surface was determined by X-ray photoelectron spectroscopy. In the experiments, we used the recording of the reflection of a test low-energy electron beam from the surface, implemented in the mode of total current spectroscopy. The theoretical analysis involves the calculation of the energy and spatial distribution of the orbitals of PTCDA molecules by the density functional theory (DFT) using B3LYP functional with the basis 6-31G(d), followed by the scaling of the calculated values of the orbital energy according to the procedure well-proven in the studies of small organic conjugated molecules. The pattern of changes in the fine structure of the total current spectra with increasing thickness of the PTCDA coating on the (GeO2)Ge surface to 6 nm was studied. At energies below 9 eV above EF, there is a maximum of the density of unoccupied electron states in the PTCDA film, formed mainly by π* molecular orbitals. The higher density maxima of unoccupied states are of σ* nature. The formation of the interface potential barrier in the deposition of PTCDA at the (GeO2)Ge surface is accompanied by an increase in the work function of the surface, Evac–EF, from 4.6 ± 0.1 to 4.9 ± 0.1 eV. This occurs when the PTCDA coating thickness increases to 3 nm, and upon further deposition of PTCDA, the work function of the surface does not change, which corresponds to the model of formation of a limited polarization layer in the deposited organic film.