29 results on '"Zaitsev, S. I."'
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2. Energy and Transport Lengths for Describing Volume of Resist Modification in Ion-Beam Lithography
3. Organic Resist Contrast Determination in Ion Beam Lithography
4. A Confocal Collimator for Radionuclide Diagnostics and X-Ray Fluorescence Analysis
5. Complex investigations of effects of charging a polymer resist (PMMA) during electron lithography
6. Comparison of the efficiency of 63Ni beta-radiation detectors made from silicon and wide-gap semiconductors
7. Simulation of e-beam penetration through multilayer structures
8. The development of the TRAP-97 software system. A sensitivity analysis
9. Improvement of the TRAP-97 computational system. Taking into consideration spatial effects in the reactor
10. Verification of the TECh'-M-97 program on the basis of experimental results obtained for a large leak on a large-scale stand with nuclear heating
11. Laser ion beam formation for nanotechnologies
12. EBIC measurements of small diffusion length in semiconductor structures
13. Simulation of the fluctuations of energy and charge deposited during e-beam exposure
14. Model of fracture of composite material with brittle fiber
15. The propagation in moving media of signals generated by sources distributed over a plane
16. Field of a constant electric dipole in a moving plasma
17. Some characteristics of stabilization of radiation in a moving isotropic plasma
18. Problem of reception of signals from a moving source in a plasma
19. Problem of establishment of radiation field of a source moving in magnetized plasma
20. Wave radiation by an oscillating electric dipole in a moving “warm” plasma
21. Validation of Advanced Computer Codes for VVER Technology: LB-LOCA Transient in PSB-VVER Facility.
22. Viscosity measurement of nanoimprint lithography resists with a rheological nanoindenter.
23. Energy dependence of proximity parameters investigated by fitting before measurement tests.
24. Accuracy of proximity correction in electron lithography after development.
25. Three-dimensional design in electron-beam lithography.
26. Dose contribution of heating in electron-beam lithography.
27. Numerical simulation of the signal formation in a scanning electron microscope with remote electrodes.
28. An investigation of the rate of Si self-interstitial annihilation at dislocations.
29. Characterisation of surface flatness by the backscattered electron coefficient.
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