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1. Influence of the electrokinetic behaviors of abrasive ceria particles and the deposited plasma-enhanced tetraethylorthosilicate and chemically vapor deposited Si[sub3]N[sub4] films in an aqueous...

Author

Sang-Kyun Kim, Sangkyu Lee, Ungyu Paik, Takeo Katoh, and Jea-Gun Park

Subjects
THIN films, CERIUM oxides, CHEMICAL vapor deposition, ELECTROKINETICS, ZETA potential
Abstract

Presents a study which investigated the effects of the electrokinetic behavior of abrasive ceria particles and chemically vapor deposited (CVD) Si[sub3]N[sub4] thin films on chemical mechanical planarization (CMP) for shallow trench isolation. Examination of the colloidal characteristics of ceria slurries; Correlation between the colloidal properties of ceria slurries and CMP; Factors which affect the surface potentials of ceria particles and CVD Si[sub3]N[sub4] thin films.

Published
2003
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