1. Analytical Calculation of Breakdown Voltage for Dielectric RESURF Power Devices
- Author
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Z. John Shen and Gourab Sabui
- Subjects
Materials science ,Physics::Optics ,Gallium nitride ,02 engineering and technology ,Dielectric ,01 natural sciences ,Condensed Matter::Materials Science ,chemistry.chemical_compound ,Electric field ,0103 physical sciences ,Silicon carbide ,Electronic engineering ,Breakdown voltage ,Power semiconductor device ,Electrical and Electronic Engineering ,010302 applied physics ,business.industry ,Doping ,Semiconductor device ,Condensed Matter::Mesoscopic Systems and Quantum Hall Effect ,021001 nanoscience & nanotechnology ,Electronic, Optical and Magnetic Materials ,chemistry ,Optoelectronics ,0210 nano-technology ,business - Abstract
Dielectric REduced SURface Field (RESURF) is a promising concept to enhance the breakdown voltage of power semiconductor devices. This letter reports a set of simple and unified analytical equations to calculate the breakdown voltage, critical electric field, and depletion widths for dielectric RESURF p-n junctions. These analytical models are derived from the basic power law relationship between the p-n junction breakdown voltage and doping concentration, and use the material and structural information of the dielectric RESURF p-n junction as variables to accurately predict reverse bias performance. The analytically calculated results are compared with 2D TCAD simulation results for Si, GaN, and SiC in combination with dielectrics, such as SiO2 and Si3N4, and show reasonable agreement well within 10% of error.
- Published
- 2017
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