Search

Van der Waals heterojunctions, formed by stacking two-dimensional materials with various structural and electronic properties, opens a new way to design new functional devices for future applications and provides an ideal research platform for exploring novel physical phenomena. In this work, bilayer graphene/WS2/metal heterojunctions (GWMHs) with vertical architecture were designed and fabricated. The tunneling current–bias voltage (It − Vb) properties of GWMHs can be tuned by 5 × 106 times in magnitude for current increasing from 0.2 nA to 1 mA with applied bias voltage increasing from 10 mV to 2 V. Moreover, the transfer properties of GWMHs exhibit n-type conduction at Vb = 0.1 V and bipolar conduction at Vb = 2 V; these findings are explained well by direct tunneling (DT) and Fowler–Nordheim tunneling (FNT), respectively. The results show the great potential of GWMHs for high-power field-effect transistors (FETs) and next-generation logic electronic devices. [ABSTRACT FROM AUTHOR]

Semiconducting molybdenum disulfide (MoS2) has drawn a lot of attention for its exceptional electronic and optoelectronic properties. Despite the potential advantages, the large contact resistance at the metal–MoS2 interfaces has been one of the biggest obstacles for the realization of ideal MoS2 transistors. One solution to improve the metal–MoS2 interfaces is to use the graphene electrodes. Here, we provide a selective etching method for fabricating graphene-contacted MoS2 transistors. It has been proved that the graphene could be totally etched with Ar+ plasma treatment, and the multilayer MoS2 flake can also be reduced layer by layer with Ar+ plasma treatment. By etching graphene selectively in graphene–MoS2 heterostructures, one can obtain graphene-contacted MoS2 transistors successfully. The transistor reported in this paper shows an on–off ratio about 106 and a carrier mobility about 42 cm2 V−1 s−1. This selective etching method would be beneficial for some other graphene-contacted electronic devices. [ABSTRACT FROM AUTHOR]