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This paper describes a parallel piezoresistive cantilever that is composed of a force-sensing cantilever in addition to a reference cantilever for photoresponse compensation. Piezoresistive cantilevers have been applied in many cellular mechanical measurement studies because of their high sensitivity, high time resolution and ease of handling. However, the electrical resistance changes in response to the excitation light of the fluorescence microscope, which affects the cell measurements. We measured the I-V characteristics of a piezoresistive layer. These photoresponses occurred due to the internal photoelectric effect. We canceled the photoresponses using the reference cantilever. This paper demonstrates compensation of the cantilever photoresponse under irradiation at different angles, wavelengths and light intensities. As a result, the photoresponse could be decreased by 87%. [ABSTRACT FROM AUTHOR]

We propose a flexible tactile sensor using sub-µm-thick Si piezoresistive cantilevers for shear stress detection. The thin Si piezoresistive cantilevers were fabricated on the device layer of a silicon on insulator (SOI) wafer. By using an adhesion-based transfer method, only these thin and fragile cantilevers were transferred from the rigid handling layer of the SOI wafer to the polydimethylsiloxane layer without damage. Because the thin Si cantilevers have high durability of bending, the proposed sensor can be attached to a thin rod-type structure serving as the finger of a robotic hand. The cantilevers were arrayed in orthogonal directions to measure the X and Y directional components of applied shear stresses independently. We evaluated the bending durability of our flexible tactile sensor and confirmed that the sensor can be attached to a rod with a radius of 10 mm. The sensitivity of the flexible tactile sensor attached to a curved surface was 1.7 × 10-6 Pa-1 on average for a range of shear stresses from -1.8 × 10-3 to 1.8 × 10-3 Pa applied along its surface. It independently detected the X and Y directional components of the applied shear stresses. [ABSTRACT FROM AUTHOR]