1. Annealing Effect on Magneto-transport Properties of Amorphous Ge1-xMnxSemiconductor Thin Films
- Author
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Byeong-Cheol Lee, Changsoo Kim, Dojin Kim, Hyo-Jin Kim, Dong-Hwi Kim, Young-Eon Ihm, Sang-Soo Yu, Kui-Jong Baek, and Tran Thi Lan Anh
- Subjects
Diffraction ,Semiconductor ,Materials science ,Magnetoresistance ,Condensed matter physics ,business.industry ,Annealing (metallurgy) ,Electrical resistivity and conductivity ,Hall effect ,Chemical vapor deposition ,business ,Amorphous solid - Abstract
Amorphous _ semiconductor thin films grown by low temperature vapor deposition were annealed at various temperatures from 400 to for 3 minutes in high vaccum chamber. The electrical and magnetotransport properties of as-grown and annealed samples have been studied. X-ray diffraction patterns analysis revealed that the samples still maintain amorphous state after annealling at for 3 minutes and they were crystallized when annealing temperature increase to . Temperature dependence of resistivity measurement implied that as-grown and annealed _ films have semiconductor characteristics, the increase of resistivity with annealling temperature was obseved. The -annealed sample exhibited negative magnetoresistance (MR) at low temperatures and the MR ratio was 8.5% at 10 K. The asymmetry was present in all MR curves. The anomalous Hall Effect was also observed at 250 K.
- Published
- 2009
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