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We present gas sensor devices based on nanocrystalline SnO 2 films, which are integrated on CMOS fabricated micro-hotplate (μhp) chips. Bimetallic nanoparticles (NPs) such as PdAu, PtAu, and PdPt have been synthesized for optimizing the sensing performance of these sensors. We demonstrate that proper functionalization with PdAu-NPs leads to a strongly improved sensitivity to the toxic gas carbon monoxide while the cross sensitivity to humidity and carbon dioxide is almost completely suppressed, which is of high importance for real life environmental conditions. We also present μhp chips employing Through-Silicon-Via (TSV) technology, which are capable for flexible 3D-integration of different types of gas sensors to a multi-parameter nanosensor system. Such CMOS integrated systems are promising candidates for realizing smart sensor devices for consumer market applications.

Integration of low voltage analog and logic circuits as well as high-voltage (HV) devices for operation at greater than 5 V enables Smart Power ICs used in almost any system that contains electronics. HVCMOS (High-Voltage CMOS) technologies offer much lower process cost, if compared to BCD technologies, they enable multiple HV levels on a single chip, and need less effort when scaling to smaller CMOS technology nodes or when integrating embedded non-volatile memory. In this work we propose a new 0.35 µm HVCMOS technology that can overcome the previous limitations in drive currents. It can match the low HV chip sizes (Rdson) of typical BCD processes while maintaining the low process complexity with only 2 mask level adders on top of CMOS. We also introduce a figure of merit (FOM) for comparing HV technologies. Key elements of making this newly proposed 0.35 µm HVCMOS so competitive to BCD technologies are discussed and a device lifetime of more than 10 years, operating temperatures of 150 °C and ESD robustness of 4 kV HBM and higher, as well as the integration of a highly robust embedded EEPROM/Flash technology is shown. We also provide first verification results of the scalability of the proposed 0.35 µm HVCMOS technology to 0.18 µm and beyond as well as to currents of up to 8 A.

With the continuing scaling of metal–oxide–semiconductor (MOS) devices, the hot-carrier (HC)-induced device degradation has become a major reliabiliy concern in sub- and deep-submicrometre MOS field-effect transistors (MOSFETs) and lateral double-diffused MOSFETs (LDMOSFETs). It is believed that the degradation is mainly due to the effects of the generated oxide-trapped charges and interface traps at the Si/SiO2 interface. In general, the large electric field is strongly localised in a well-defined region; therefore carrier injection and interface-trap creation are similarly concentrated. The strongly inharmonious characters of HC injection and resulting damage present a considerable challenge to both experimental and modelling efforts.The HC degradation behaviour of an n-channel LDMOS transistor is investigated under various stress conditions. By applying variable base charge pumping experiments, a consistent picture of the degradation mechanism can be depicted. HC-induced interface traps are generated in the channel region of the device, in the drift region below the thick field oxide and at the bird's beak edge. The latter is shown to dominate the degradation of Idlin, which is the most critical parameter concerning HC lifetime in this specific device.