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会議情報: 第13回宇宙科学シンポジウム (2013年1月8日-9日. 宇宙航空研究開発機構宇宙科学研究所(JAXA)(ISAS)相模原キャンパス), 相模原市, 神奈川県, 著者人数: 30名, Meeting Information: 13th Space Science Symposium (January 8-9, 2013. Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency(JAXA)(ISAS)Sagamihara Campus), Sagamihara, Kanagawa Japan

We report on NuSTAR and Swift observations of a soft state of the neutron star low-mass X-ray binary GS 1826–24, commonly known as the "clocked" burster. The transition to the soft state was recorded in 2014 June through an increase of the 2–20 keV source intensity measured by MAXI, simultaneous with a decrease of the 15–50 keV intensity measured by Swift/BAT. The episode lasted approximately two months, after which the source returned to its usual hard state. We analyze the broadband spectrum measured by Swift/XRT and NuSTAR and estimate the accretion rate during the soft episode to be ≈ 13% mEdd within the range of previous observations. However, the best-fit spectral model, adopting the double Comptonization used previously, exhibits significantly softer components. We detect seven type-I X-ray bursts, all significantly weaker (and with shorter rise and decay times) than observed previously. The burst profiles and recurrence times vary significantly, ruling out the regular bursts that are typical for this source. One burst exhibited photospheric radius expansion and we estimate the source distance as (5.7 ±0.2) ξb-1/2kpc, where ξb parameterizes the possible anisotropy of the burst emission. The observed soft state may most likely be interpreted as a change in accretion geometry at about similar bolometric luminosity as in the hard state. The different burst behavior can therefore be attributed to this change in accretion flow geometry, but the fundamental cause and process for this effect remain unclear.

著者人数：11名, Accepted: 2010-06-22

We describe a technology to mass-produce ultrathin mirror substrates for x-ray telescopes of near Wolter-I geometry. Thermal glass forming is a low-cost method to produce high-throughput, spaceborne x-ray mirrors for the 0.1-200-keV energy band. These substrates can provide the collecting area envisioned for future x-ray observatories. The glass microsheets are shaped into mirror segments at high temperature by use of a guiding mandrel, without polishing. We determine the physical properties and mechanisms that elucidate the formation process and that are crucial to improve surface quality. We develop a viscodynamic model for the glass strain as the forming proceeds to find the conditions for repeatability. Thermal forming preserves the x-ray reflectance and scattering properties of the raw glass. The imaging resolution is driven by a large wavelength figure. We discuss the sources of figure errors, and we calculate the relaxation time of surface ripples.

We have developed a new depth-graded multilayer system comprising W and SiC layers, suitable for use as hard x-ray reflective coatings operating in the energy range 100-200 keV. Grazing-incidence x-ray reflectance at E = 8 keV was used to characterize the interface widths, as well as the temporal and thermal stability in both periodic and depth-graded W/SiC structures, whereas synchrotron radiation was used to measure the hard x-ray reflectance of a depth-graded multilayer designed specifically for use in, the range Esimilar to150-170 keV. We have modeled the hard x-ray reflectance using newly derived optical constants, which we determined from reflectance versus incidence angle measurements also made using synchrotron radiation, in the range E = 120-180 keV. We describe our experimental investigation in detail, compare the new W/SiC multilayers with both W/Si and W/B4C films that have been studied previously, and discuss the significance of these results with regard to the eventual development of a hard x-ray nuclear line telescope.

We describe the development of depth-graded W/Si multilayer films prepared by magnetron sputtering for use as broad-band reflective coatings for hard x-ray optics. We have used specular and nonspecular x-ray reflectance analysis to characterize the interface imperfections in both periodic and depth-graded W/Si multilayer structures, and high-resolution transmission electron microscopy (TEM) and selected area electron diffraction (SAED) to characterize the interface structure and layer morphology as a function of depth in an optimized depth-graded multilayer. From x-ray analysis we find interface widths in the range sigma=0.275-0.35 nm for films deposited at low argon pressure (with a slight increase in interface width for multilayers having periods greater than similar to 20 nm, possibly due to the transition from amorphous to polycrystalline metal layers identified by TEM and SAED), and somewhat larger interface widths (i.e., sigma=0.35-0.4 nm) for structures grown at higher Ar pressures, higher background pressures, or with larger target-to-substrate distances. We find no variation in interface widths with magnetron power. Nonspecular x-ray reflectance analysis and TEM suggest that the dominant interface imperfection in these films is interfacial diffuseness; interfacial roughness is minimal (sigma(r)similar to 0.175 nm) in structures prepared under optimal conditions, but can increase under conditions in which the beneficial effects of energetic bombardment during growth are compromised. X-ray reflectance analysis was also used to measure the variation in the W and Si deposition rates with bilayer thickness: we find that the W and Si layer thicknesses are nonlinear with the deposition times, and we discuss possible mechanisms responsible for this nonlinearity. Finally, hard x-ray reflectance measurements made with synchrotron radiation were used to quantify the performance of optimized depth-graded W/Si structures over the photon energy range from 18 to 212 keV.