1. Hole Capture-Structural Relaxation Mechanism of Defect Generation in Ionizing-irradiated $a$-SiO$_2$
- Author
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Song, Yu, Qiu, Chen, and Wei, Su-Huai
- Subjects
Condensed Matter - Materials Science ,Physics - Applied Physics - Abstract
The permanent ionization damage of semiconductor devices in harsh radiation environments stems from $E'_\gamma$ defect centers generation in the $a$-SiO$_2$ dielectric or isolation layers, but the long-standing "hole transport-trapping" generation mechanism encounters dilemmas to explain recent experiments. In this work, we propose a new "hole capture-structural relaxation" (HCSR) mechanism, based on spin-polarized first-principles calculations of oxygen vacancies ($V_{\rm O}$'s) in $a$-SiO$_2$. It is found that due to an electronic metastability caused by the localization of defect electronic states, the previously suggested puckered precursor, $V_{O\gamma}$, cannot exist in $a$-SiO$_2$, and the $E'_\gamma$ centers can arise from a structural relaxation of dimer $V_{O\delta}$ after nonradiative capture of irradiation-induced valence band holes. We demonstrate that, such an HCSR mechanism can consistently explain the basic but puzzling temperature and electric-field dependences in recent experiments. Moreover, by using reaction rate theory, we derive an analytical formula to uniformly describe the sublinear experimental data over a wide dose and temperature range. This work not only provides a rationale for defect generation in ionizing-irradiated $a$-SiO$_2$, but also offer a general approach to understanding the irradiation physics in alternative dielectrics and wide-band gap semiconductors with intrinsic electronic metastability., Comment: 5 pages, 3 figures
- Published
- 2024