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Evolution of morphology change was investigated for ZnO nanoneedle array grown by low-temperature MOCVD. Well-aligned ZnO nanoneedle array was deposited on the ZnO buffer-film/Si substrate at temperatures below 500°C. A rod-shaped ZnO nanowire in the initial growth stage changed into needle-shaped as the deposition proceeds. ZnO nanoneedle array deposited on the annealed buffer-film showed better alignment compared to that deposited on the as-grown film. XPS analysis showed that Zn 2p peak has a single binding energy state of a stoichiometric Zn–O bond while O 1 s peak has three different chemical binding states. Highly crystalline ZnO nanoneedle array showed a strong bandedge emission at 380 nm in photoluminescence measurements. [ABSTRACT FROM AUTHOR]

Plasma-enhanced atomic layer deposition (PE-ALCVD) of ZrO2 was performed to coat SiC nanowires and prepare a SiC-ZrO2 core-shell nanowire structure. Zirconium tertiary butoxide (ZTB) and hydrogen plasma pulse cycles were used to grow ZrO2 films. The growth temperature of ZrO2 PE-ALCVD was 150°C with a growth rate of 1.3 Å/cycle. SEM and TEM images showed uniform coating of SiC nanowires with ZrO2. The thickness of ZrO2 coat layer could be controlled by the total number of the pulse cycles. After being annealed at 900°C, a polycrystalline structure of ZrO2 layer was observed. [ABSTRACT FROM AUTHOR]