1. Analysis of stress gradients in physical vapour deposition multilayers by X-ray diffraction at fixed depth intervals.
- Author
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Fischer, G., Selvadurai, U., Nellesen, J., Sprute, T., and Tillmann, W.
- Subjects
PHYSICAL vapor deposition ,X-ray diffraction ,MULTILAYERS ,RESIDUAL stresses ,OPTICAL properties of metallic films - Abstract
The objective of this article is to develop and apply a model for the design and evaluation of X-ray diffraction experiments to measure phase-specific residual stress profiles in multilayer systems. Using synchrotron radiation and angledispersive diffraction, the stress measurements are performed on the basis of the sin
2 method. Instead of the traditional Ω or X mode, the experiments are carried out by a simultaneous variation of the goniometer angles X, Ω and ψG to ensure that the penetration and information depth and the measuring direction ψ remain unchanged when the polar angle ψ is varied. The applicability of this measuring and evaluation strategy is demonstrated by the example of a multilayer system consisting of Ti and TiAlN layers, alternately deposited on a steel substrate by means of physical vapour deposition. [ABSTRACT FROM AUTHOR]- Published
- 2014
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