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1. Constrained geometrical analysis of complete K‐line patterns for calibrationless auto‐indexing.

2. Incorporating particle symmetry into orientation determination in single‐particle imaging.

3. Coherent diffraction imaging: consistency of the assembled three-dimensional distribution.

4. Common arc method for diffraction pattern orientation.

5. Crystal structure of the 4 + 2 cyclo-adduct of photooxidized anthracene and C60 fullerene.

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