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6. Exploring the Physical Origin of the Negative Capacitance Effect in a Metal–Ferroelectric–Metal–Dielectric Structure

7. Top Electrode Engineering for High‐Performance Ferroelectric Hf 0.5 Zr 0.5 O 2 Capacitors

12. Double S‐Shaped Polarization – Voltage Curve and Negative Capacitance from Al 2 O 3 ‐Hf 0.5 Zr 0.5 O 2 ‐Al 2 O 3 Triple‐Layer Structure

14. Atomic Layer Deposition of Sb 2 Te 3 /GeTe Superlattice Film and Its Melt‐Quenching‐Free Phase‐Transition Mechanism for Phase‐Change Memory

15. Oxygen‐Scavenging Effects of Added Ti Layer in the TiN Gate of Metal‐Ferroelectric‐Insulator‐Semiconductor Capacitor with Al‐Doped HfO 2 Ferroelectric Film (Adv. Electron. Mater. 11/2022)

17. Investigation of Optimum Deposition Conditions of Radio Frequency Reactive Magnetron Sputtering of Al0.7Sc0.3N Film with Thickness down to 20 nm

20. Demonstration of Neuromodulation‐inspired Stashing System for Energy‐efficient Learning of Spiking Neural Network using a Self‐Rectifying Memristor Array (Adv. Funct. Mater. 29/2022)

22. Oxygen‐Scavenging Effects of Added Ti Layer in the TiN Gate of Metal‐Ferroelectric‐Insulator‐Semiconductor Capacitor with Al‐Doped HfO 2 Ferroelectric Film

35. Enhanced Ferroelectric Properties in Hf 0.5 Zr 0.5 O 2 Films Using a HfO 0.61 N 0.72 Interfacial Layer

43. Comparative Study on the Gate‐Induced Electrical Instability of p‐Type SnO Thin‐Film Transistors with SiO2 and Al2O3/SiO2 Gate Dielectrics

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