1. The Suppression of Contamination in the Convergent-Beam Electron Diffraction Camera
- Author
-
W. C. T. Dowell and P. Goodman
- Subjects
Materials science ,Reflection high-energy electron diffraction ,Low-energy electron diffraction ,Gas electron diffraction ,business.industry ,General Physics and Astronomy ,Optics ,Electron diffraction ,Physical and Theoretical Chemistry ,Selected area diffraction ,Electron beam-induced deposition ,business ,Kikuchi line ,Mathematical Physics ,Electron backscatter diffraction - Abstract
It has been demonstrated that specimen contamination in convergent-beam diffraction operation can be prevented by maintaining the specimen temperature between -110 °C and -165 °C, without the use of especially high or clean vacuum conditions. At these temperatures, surface migration of molecules causing contamination is evidently inhibited. Precautions to prevent deposition from the vapour phase both before and after cooling are also required.
- Published
- 1977
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