1. Research on (Ti,Al)N Films Deposited by FCVA
- Author
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You Long Zhou, Zhou Chen, Sheng Xing Ji, Huang Nan, and Nan Huang
- Subjects
Diffraction ,Materials science ,Metallurgy ,General Engineering ,Analytical chemistry ,chemistry.chemical_element ,Nitrogen atmosphere ,Vacuum arc ,Crystal structure ,Cathodic protection ,chemistry ,Nitrogen partial pressure ,Phase (matter) ,Tin - Abstract
：(Ti, Al)N films were deposited on high-speed steel (HSS) by filtered cathodic vacuum arc (FCVA) technique under a nitrogen atmosphere. X-ray diffraction was used to characterize the structure of the films .The micro-hardness was tested. The result shows that the crystal structure and mechanical properties of (Ti,Al)N films are strongly dependent on the nitrogen partial pressure. The structure of (Ti,Al)N films is composed of Ti2N phase, TiN phase and TixAly phase. The hardness increases to a maximum at the nitrogen partial pressure of 8•0×10-2Pa, then decreases with increasing nitrogen partial pressure.
- Published
- 2012
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