42 results on '"Saito, Nobuo"'
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2. Microcrystallization of Amorphous SiC:H Films Prepared by Reactive Sputtering in He
3. Properties of the Ni-Cr Oxide Films Prepared by Magnetron Sputtering
4. Microcrystallization of Amorphous GeC: H Films Prepared by Reactive Sputtering
5. Effect of rf Power on the Properties of a-SiCS:H:F Films by rf Sputtering Using SF6
6. Amorphous SiCS:H Films Prepared by Magnetron Sputtering of Si in CH4 and H2S
7. Amorphous SiCS:H:F Films Prepared by Magnetron Sputtering of Si in CH4 and SF6.
8. Properties of Amorphous SiC:O:H Films Prepared by Magnetron Sputtering of Si in CH4 and CO2.
9. SHINKU
10. InN Films Prepared by Sputtering in N2 and H2. Effects of H2 Pressure on Film Properties.
11. Oxygen Doped Amorphous GeC:H Films Prepared by Reactive Sputtering.
12. SHINKU
13. Properties of InN Films Prepared by Magnetron Sputtering.
14. Properties of Ge doped a-SixCy:H Films prepared by co-sputtering.
15. Mechanical Properties of B(C,N) Thin Film by Plasma-assisted Chemical Vapor Deposition.
16. Preparation and Characterization of Zn-doped InSe Thin Films by a Hot Wall Evaporation.
17. Nitrogen-doped a-SiGe:H Films Prepared by PE CVD.
18. Ga Doped a-SiG:H Films Propared by Sputtering Using Composite Target.
19. Electrical and Optical Properties of GeSe2:H Films Prepared by Reactive-Plasma Assisted Deposition.
20. Amorphous Ge-C Thin Films Prepared by rf Sputtering.
21. Electrical and Optical Properties of GeSe:Bix Films Prepared by Electron Beam Evaporation.
22. SHINKU
23. Electrical and Optical Properties of a-SiCN:H Films Prepared by PE-CVD.
24. Electrical and Optical Properties of a-Ge1-xSex:H films Prepared by Reactive-Plasma-Assisted Deposition.
25. Influence of RF Power on the Properties of PE-CVD a-SiC: H Films Showing a Negative Temperature Coefficient in D.C. Conductivity.
26. Properties of Reactively Magnetron Sputtered Amorphous GeC: H Films.
27. Preparation and Properties of In-doped Amorphous SiC:H Films by Co-sputtering.
28. Improvement of Photoconductivity in P-CVD a-SiC:H Films Doped with Nitrogen.
29. Properties nitrogen containing magnetron sputtered amorphous SiC:H films.
30. Preparation and properties of Sb-doped amorphous SiC:H films by co-sputtering.
31. Influence of SiH4/CH4 gas flow rate ratio on the properties of a-SiC:H films showing a negative temperature coeffcient in D.C. conductivity.
32. Preparation and optical properties of B-doped amorphous SiC:H films by Co-sputtering.
33. Electrical properties of Al-doped and B-doped amorphous SiC:H films prepared by cosputtering.
34. Annealing effects of conductivity for a-Si1-xCx:H films prepared by R.F. glow discharge decomposition.
35. Optical and electrical properties of amorphous SiC:H prepared by magnetron sputtering.
36. SHINKU
37. SHINKU
38. Dependence of deposition conditions on amorphous SiC:H thin films prepared by magnetron sputtering method using CH4.
39. Observation of a-SiC: H films by XPS.
40. XPS spectral shift from negative charged a-Si1-xCx:H films on a quartz glass substrate.
41. Subustrate temperature dependence of a-SiC:H films prepared by R.F. glow discharge decomposition.
42. Preparation and properties of Co-sputtered amorphous SixCyAlz:H films.
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