1. Non-thermal desorption/ablation of molecular solids induced by ultra-short soft x-ray pulses
- Author
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Thomas Tschentscher, Janos Hajdu, Marek Jurek, Jaromír Chalupský, Libor Juha, J. Cihelka, Kai Tiedtke, Jacek Krzywinski, Stéphane Sebban, Philippe Zeitoun, Richard A. London, Sven Toleikis, E. Papalazarou, G. Rey, Ryszard Sobierajski, Nikola Stojanovic, Jerzy B. Pelka, Věra Hájková, H. Wabnitz, L. Vysin, Stefan P. Hau-Riege, Constance Valentin, Julien Gautier, Institute of Physics (PALS), Czech Academy of Sciences [Prague] (CAS), Czech Technical University in Prague (CTU), Laboratoire d'optique appliquée (LOA), École Nationale Supérieure de Techniques Avancées (ENSTA Paris)-École polytechnique (X)-Centre National de la Recherche Scientifique (CNRS), Laboratory of Molecular Biophysics [Uppsala], Department of Cell and Molecular Biology [Uppsala], Uppsala University-Uppsala University, Lawrence Livermore National Laboratory (LLNL), Institute of Physics in Poland, Polska Akademia Nauk = Polish Academy of Sciences (PAN), and Deutsches Elektronen-Synchrotron [Hamburg] (DESY)
- Subjects
Boron Compounds ,Microscope ,Materials science ,Surface Properties ,Ultraviolet Rays ,Thermal desorption ,Electrons ,macromolecular substances ,02 engineering and technology ,Microscopy, Atomic Force ,01 natural sciences ,Soft laser desorption ,law.invention ,Optics ,law ,Desorption ,0103 physical sciences ,Surface roughness ,Polymethyl Methacrylate ,ddc:530 ,Irradiation ,010306 general physics ,[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics] ,business.industry ,Lasers ,X-Rays ,021001 nanoscience & nanotechnology ,Laser ,Carbon ,Atomic and Molecular Physics, and Optics ,Spectrophotometry ,Laser Therapy ,0210 nano-technology ,business ,Beam (structure) - Abstract
International audience; We report the first observation of single-shot soft x-ray laser induced desorption occurring below the ablation threshold in a thin layer of poly (methyl methacrylate) - PMMA. Irradiated by the focused beam from the Free-electron LASer in Hamburg (FLASH) at 21.7nm, the samples have been investigated by atomic-force microscope (AFM) enabling the visualization of mild surface modifications caused by the desorption. A model describing non-thermal desorption and ablation has been developed and used to analyze single-shot imprints in PMMA. An intermediate regime of materials removal has been found, confirming model predictions. We also report below-threshold multiple-shot desorption of PMMA induced by high-order harmonics (HOH) at 32nm. Short-time exposure imprints provide sufficient information about transverse beam profile in HOH's tight focus whereas long-time exposed PMMA exhibits radiation-initiated surface ardening making the beam profile measurement infeasible.
- Published
- 2008
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