9 results on '"Paruchuri, Vamsi"'
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2. High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes
3. Electrical and Materials Characterization of Reactive and Co-Sputtered Tantalum Carbide Metal Electrodes for High-K Gate Applications
4. Engineering Band-Edge High-κ/Metal Gate n-MOSFETs with Cap Layers Containing Group IIA and IIIB Elements by Atomic Layer Deposition
5. Optimizing Band-Edge High-κ/Metal Gate n-MOSFETs with ALD Lanthanum Oxide Cap Layers: Oxidant and Positioning Effects
6. Methodology of ALD HfO2 High-κ Gate Dielectric Optimization by Cyclic Depositions and Anneals
7. (Invited) The Past, Present and Future of High-k/Metal Gates
8. Opportunities and Challenges of FinFET as a Device Structure Candidate for 14nm Node CMOS Technology
9. Charge Defects, Vt Shifts, and the Solution to the High-K Metal Gate n-MOSFET Problem
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