8 results on '"Reichmanis, E."'
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2. Fundamental Studies of Dissolution Inhibitors in Poly(norbornene-alt-maleic anhydride) Based Resins.
3. Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing.
4. A Commercially Viable 193 nm Single Layer Resist Platform.
5. Materials Design Considerations for Future Lithographic Technologies.
6. Sensitivity enhancement of t-BOC based chemically amplified resists through optimization of process prebake conditions.
7. The synthesis, characterization and lithographic behavior of acid photogenerating systems based upon 2-nitrobenzyl ester derivatives.
8. Chemically amplified resists: The chemistry and lithographic characteristics of nitrobenzyl benzenesulfonate derivatives.
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