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Pure organic room-temperature phosphorescence (RTP), particularly from guest-host doped systems, has seen exponential growth in the last several years due to their high modulation flexibility, and yet challenges remain with respect to mechanistic elucidations and advantageous applications. Here we show that by constructing guest-host doped RTP systems from chiral components, namely, chiral amino compound-modified phthalimide hosts and naphthalimide guests, a chiral-selective RTP enhancement phenomenon can be observed. For example, R-enantiomeric guests in R-enantiomeric hosts produce strong red RTP afterglow while no appreciable RTP could be observed in the S-R guest-host counterpart. An unprecedented RTP intensity difference > 102 folds with the ability to distinguish an enantiomeric excess of 98% could be achieved. Temperature-dependent measurements suggest that a chirality-dependent energy transfer process may be involved in the observed phenomenon, which can be harnessed to extend the RTP application to the chiral recognition of amino compounds, such as amino alcohols.

Although the solution deposition of YBa2Cu3O7−x (YBCO) superconducting films is cost effective and capable of large-scale production, further improvements in their superconductivity are necessary. In this study, a deep UV (DUV) irradiation technique combined with a low-fluorine solution process was developed to prepare YBCO films. An acrylic acidic group as the chelating agent was used in the precursor solution. The acrylic acidic group was highly sensitive to DUV light at 254 nm and significantly absorbed UV light. The coated gel films exposed to DUV light decomposed at 150 °C and copper aggregation was prevented. The UV irradiation promoted the removal of the carbon residue and other by-products in the films, increased the density and enhanced the crystallinity and superconductivity of the YBCO films. Using a solution with F/Ba = 2, YBCO films with thicknesses of 260 nm and enhanced critical current densities of nearly 8 MA/cm2 were produced on the LaAlO3 (LAO) substrates.