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In the present study, various statistical and machine learning (ML) techniques were used to understand how device fabrication parameters affect the performance of copper oxide-based resistive switching (RS) devices. In the present case, the data was collected from copper oxide RS devices-based research articles, published between 2008 to 2022. Initially, different patterns present in the data were analyzed by statistical techniques. Then, the classification and regression tree algorithm (CART) and decision tree (DT) ML algorithms were implemented to get the device fabrication guidelines for the continuous and categorical features of copper oxide-based RS devices, respectively. In the next step, the random forest algorithm was found to be suitable for the prediction of continuous-type features as compared to a linear model and artificial neural network (ANN). Moreover, the DT algorithm predicts the performance of categorical-type features very well. The feature importance score was calculated for each continuous and categorical feature by the gradient boosting (GB) algorithm. Finally, the suggested ML guidelines were employed to fabricate the copper oxide-based RS device and demonstrated its non-volatile memory properties. The results of ML algorithms and experimental devices are in good agreement with each other, suggesting the importance of ML techniques for understanding and optimizing memory devices.

In recent years, resistive switching memory devices are attracted much attention for high-density non-volatile memory applications owing to their cell scalability, multilevel operations, and 3D capability in crossbar memory arrays. In this work, we report the forming-free and multilevel resistive switching properties of hydrothermally synthesized hexagonal molybdenum oxide (h-MoO3) microrods. The formation of h-MoO3 microrods was confirmed by using the X-ray diffraction technique and scanning electron microscopy. Different chemical properties of h-MoO3 microrods were determined by energy-dispersive X-ray, photoluminescence, Raman, and X-ray photoelectron spectroscopic techniques. The memory device was fabricated in a Ti/MoO3/FTO structure and its bipolar resistive switching properties were investigated. The memory device shows voltage-dependent tunable I-V properties and shows electroforming-free operation. Moreover, we have calculated the different memristive properties and showed that the device possesses double-valued charge-magnetic flux characteristics, suggesting the dominance of memristive properties in the Ti/MoO3/FTO device. We further explored the multilevel resistive switching property of the device by varying the RESET voltage. The Ti/MoO3/FTO memristive device can able to show four distinct resistive states during endurance and retention tests. The statistical analysis suggested that the device has less variation during the cycle-to-cycle operation. The device conduction mechanism was obtained by fitting different charge transport models, and a possible resistive switching mechanism is presented based on the observed multilevel resistive switching effect of the Ti/MoO3/FTO memristive device.

In the present investigation, we have experimentally demonstrated the coexistence of filamentary and homogeneous resistive switching mechanisms in single Al/MnO2/SS thin film metal–insulator–metal device. The voltage-induced resistive switching leads to clockwise and counter-clockwise resistive switching effects. The present investigations confirm that the coexistence of both RS mechanisms is dependent on input voltage, charge-flux and time. Furthermore, the non-zero I–V crossing locations and crossovers hysteresis loops suggested that the developed device has memristive and meminductive properties. The memristive and meminductive memory effects are further confirmed by electrochemical impedance spectroscopy. The results suggested that the mem-device dynamics and electrochemical kinetics during different voltage sweeps and sweep rates are responsible for the coexistence of filamentary and homogeneous resistive switching mechanisms as well as memristive and meminductive memory effect in single Al/MnO2/SS metal–insulator–metal device. The coexistence of both RS effects is useful for the development of high-performance resistive memory and electronic synapse devices. Furthermore, the coexistence of memristive and meminductive memory effects is important for the development of adaptive and self-resonating devices and circuits. Published version

In the present investigation, we have experimentally demonstrated the bipolar resistive switching with the coexistence of three fundamental memelements in the Ag/CoFe2O4/FTO thin film metal-insulator-metal (MIM) device. The device shows the analog resistive switching behavior and charge transport follows the Ohmic and space charge limited conduction (SCLC) mechanisms. The device transforms from asymmetric to symmetric resistive switching when the SCLC conduction mechanism change to the Ohmic conduction mechanism at higher voltage sweep rates. It was observed that the I–V crossing location of MIM device shifted towards the higher voltage range with increasing voltage sweep rates for both bias regions due to the nanobattery effect. The significant tunneling gap between immature conductive filament(s) and percolation channels was responsible for the coexistence of memelements and nanobattery effect in the Ag/CoFe2O4/FTO thin film MIM device.

In this paper, we report the effect of the write voltage and frequency on memristor-based resistive random access memory (RRAM). The above-said parameters have been investigated on the linear drift model of the memristor. With a variation of write voltage from 0.2 to 1.2 V and a subsequent frequency modulation from 1, 2, 4, 10, 100 and 200 Hz, the corresponding effects on memory window, low resistance state (LRS) and high resistance state (HRS) have been reported. Thus, the lifetime (τ) reliability analysis of memristor-based RRAM is carried out using the above results. It is found that the HRS is independent of the write voltage, whereas LRS shows dependency on write voltage and frequency. The simulation results showcase the fact that the memristor possesses higher memory window and lifetime (τ) in the higher voltage with lower frequency region, which has been attributed to less data losses in the memory architecture.

Nanocrystalline, uniform, pentanary mixed metal chalcogenide (PMMC) thin films of copper indium cadmium sulfoselenide (CuInCd(SSe)3) were successfully synthesized using simple, self-organized, arrested precipitation technique in an aqueous alkaline medium. The optical, structural, morphological, compositional and electrical properties of synthesized thin films were investigated as a function indium (In3+) concentration. An optical absorption study revealed that direct allowed transition and band gap energy decreases typically from 1.46 to 1.25 eV. The X-ray diffraction studies revealed that the PMMC thin films have a nanocrystalline nature and crystallite size increases with the increase in the In3+ concentration. Tuning of surface morphology from nanospheres to peas-like morphology with uniform, well-adhered distributed throughout the substrate surface were observed by field emission scanning electron microscopy micrographs. The high-resolution transmission electron microscopy images and selected area electron diffraction pattern were illustrated that compactly interconnected particles with nanocrystalline nature. Energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy results confirmed that synthesized thin films had an appropriate chemical purity. The electrical conductivity and thermoelectric power measurement indicates that, the films have n-type conductivity. A photoelectrochemical conversion efficiency of 2.40% was achieved with a current density of 2.87 mA/cm2. The developed route may provide an alternative approach to synthesize multinary metal chalcogenide thin-film solar cell. Furthermore, we have developed a predictive model of a CICSSe thin-film solar cell using the artificial neural network. The proposed model is useful for the integrated development environment for the predictive modeling and design of high-efficient solar cells.

The unique nonlinear relationship between charge and magnetic flux along with the pinched hysteresis loop in I-V plane provide memory with resistance combinations of attribute to Memristor which lead to their novel applications in non volatile memory, nonlinear dynamics, analog computations and neuromorphic biological systems etc. The present paper reports development of Ag/WO3/ITO thin film memristor device using spray pyrolysis method. The structural, morphological and electrical properties of the thin film memristor device are further characterized using x-ray diffraction (XRD), Scanning Electron Microscopy (SEM), and semiconductor device analyzer. The memristor is simulated using linear dopent drift model to ascertain the theoretical and experimental conformations. For the simulation purpose, the width of doped region (w) limited to the interval [0, D] is considered as a state variable along with the window function characterized by the equation f (x) = w (1 − w). The reported memristor device exhibits the symmetric pinched hysteresis loop in I-V plane within the low operating voltage (±1 V).